Evolution of the opening size of nanosphere lithography masks during thermal annealing
T. Riedl, V. Kunnathully, J. Lindner, (2017).
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Conference Paper
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Author
Riedl, ThomasLibreCat;
Kunnathully, Vinay;
Lindner, JörgLibreCat
Publishing Year
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poster V.14.72
Conference
E-MRS Spring Meeting 2017
Conference Location
Straßburg (France)
Conference Date
2017-05-22 – 2017-05-26
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Riedl T, Kunnathully V, Lindner J. Evolution of the opening size of nanosphere lithography masks during thermal annealing. 2017.
Riedl, T., Kunnathully, V., & Lindner, J. (2017). Evolution of the opening size of nanosphere lithography masks during thermal annealing. Presented at the E-MRS Spring Meeting 2017, Straßburg (France).
@article{Riedl_Kunnathully_Lindner_2017, series={poster V.14.72}, title={Evolution of the opening size of nanosphere lithography masks during thermal annealing}, author={Riedl, Thomas and Kunnathully, Vinay and Lindner, Jörg}, year={2017}, collection={poster V.14.72} }
Riedl, Thomas, Vinay Kunnathully, and Jörg Lindner. “Evolution of the Opening Size of Nanosphere Lithography Masks during Thermal Annealing.” Poster V.14.72, 2017.
T. Riedl, V. Kunnathully, and J. Lindner, “Evolution of the opening size of nanosphere lithography masks during thermal annealing.” 2017.
Riedl, Thomas, et al. Evolution of the Opening Size of Nanosphere Lithography Masks during Thermal Annealing. 2017.
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