Regular surface patterns by local swelling induced by He implantation into silicon through nanosphere lithography masks
J. Lindner, C. Seider, F. Fischer, M. Weinl, B. Stritzker, Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 267 (2009) 1394–1397.
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Regular Silicon Surface Patterns by Local Swelling Induced by He Implantation through Nanosphere Lithography Masks.pdf
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Journal Article
| Published
| English
Author
Lindner, JörgLibreCat;
Seider, C.;
Fischer, F.;
Weinl, M.;
Stritzker, B.
Abstract
Nanopatterning of silicon surfaces by means of He+ ion implantation through self-organized colloidal
masks is reported for the first time. Nanosphere lithography (NSL) masks with mask openings of 46–
230 nm width were deposited on Si(100) wafers. He+ ions were implanted through these masks in order
to induce a local cavity formation and Si surface swelling. The surface morphology and the subsurface
structure were studied using atomic force microscopy (AFM) and cross-sectional transmission electron
microscopy (XTEM), respectively, as a function of mask and implantation parameters. It is demonstrated
that regular arrays of both individual hillocks and trough-like circular rings can be generated.
Publishing Year
Journal Title
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
Volume
267
Issue
8-9
Page
1394-1397
ISSN
LibreCat-ID
Cite this
Lindner J, Seider C, Fischer F, Weinl M, Stritzker B. Regular surface patterns by local swelling induced by He implantation into silicon through nanosphere lithography masks. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 2009;267(8-9):1394-1397. doi:10.1016/j.nimb.2009.01.052
Lindner, J., Seider, C., Fischer, F., Weinl, M., & Stritzker, B. (2009). Regular surface patterns by local swelling induced by He implantation into silicon through nanosphere lithography masks. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 267(8–9), 1394–1397. https://doi.org/10.1016/j.nimb.2009.01.052
@article{Lindner_Seider_Fischer_Weinl_Stritzker_2009, title={Regular surface patterns by local swelling induced by He implantation into silicon through nanosphere lithography masks}, volume={267}, DOI={10.1016/j.nimb.2009.01.052}, number={8–9}, journal={Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms}, publisher={Elsevier BV}, author={Lindner, Jörg and Seider, C. and Fischer, F. and Weinl, M. and Stritzker, B.}, year={2009}, pages={1394–1397} }
Lindner, Jörg, C. Seider, F. Fischer, M. Weinl, and B. Stritzker. “Regular Surface Patterns by Local Swelling Induced by He Implantation into Silicon through Nanosphere Lithography Masks.” Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 267, no. 8–9 (2009): 1394–97. https://doi.org/10.1016/j.nimb.2009.01.052.
J. Lindner, C. Seider, F. Fischer, M. Weinl, and B. Stritzker, “Regular surface patterns by local swelling induced by He implantation into silicon through nanosphere lithography masks,” Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, vol. 267, no. 8–9, pp. 1394–1397, 2009.
Lindner, Jörg, et al. “Regular Surface Patterns by Local Swelling Induced by He Implantation into Silicon through Nanosphere Lithography Masks.” Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, vol. 267, no. 8–9, Elsevier BV, 2009, pp. 1394–97, doi:10.1016/j.nimb.2009.01.052.
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