Modification of block copolymer lithography masks by O2 plasma treatment: Insights from lift off experiments, nanopore etching and free membranes
K. Brassat, D. Kool, J. Lindner, To Be Submitted (n.d.).
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Brassat K, Kool D, Lindner J. Modification of block copolymer lithography masks by O2 plasma treatment: Insights from lift off experiments, nanopore etching and free membranes. To be submitted.
Brassat, K., Kool, D., & Lindner, J. (n.d.). Modification of block copolymer lithography masks by O2 plasma treatment: Insights from lift off experiments, nanopore etching and free membranes. To Be Submitted.
@article{Brassat_Kool_Lindner, title={Modification of block copolymer lithography masks by O2 plasma treatment: Insights from lift off experiments, nanopore etching and free membranes}, journal={To be submitted}, author={Brassat, Katharina and Kool, Daniel and Lindner, Jörg} }
Brassat, Katharina, Daniel Kool, and Jörg Lindner. “Modification of Block Copolymer Lithography Masks by O2 Plasma Treatment: Insights from Lift off Experiments, Nanopore Etching and Free Membranes.” To Be Submitted, n.d.
K. Brassat, D. Kool, and J. Lindner, “Modification of block copolymer lithography masks by O2 plasma treatment: Insights from lift off experiments, nanopore etching and free membranes,” To be submitted.
Brassat, Katharina, et al. “Modification of Block Copolymer Lithography Masks by O2 Plasma Treatment: Insights from Lift off Experiments, Nanopore Etching and Free Membranes.” To Be Submitted.
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