Laterally resolved doping by focused ion beam implantation

D. Reuter, C. Meier, M.A. Alvarez, J. Koch, A.D. Wieck, in: IECON Proc. , 2000, p. 1878.

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IECON Proc.
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1878
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26th Annual Conference of the IEEE-Industrial-Electronics-Society
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Reuter D, Meier C, Alvarez MA, Koch J, Wieck AD. Laterally resolved doping by focused ion beam implantation. In: IECON Proc. . ; 2000:1878.
Reuter, D., Meier, C., Alvarez, M. A., Koch, J., & Wieck, A. D. (2000). Laterally resolved doping by focused ion beam implantation. In IECON Proc. (p. 1878).
@inproceedings{Reuter_Meier_Alvarez_Koch_Wieck_2000, title={Laterally resolved doping by focused ion beam implantation}, booktitle={IECON Proc. }, author={Reuter, D. and Meier, Cedrik and Alvarez, M. A. and Koch, J. and Wieck, A. D.}, year={2000}, pages={1878} }
Reuter, D., Cedrik Meier, M. A. Alvarez, J. Koch, and A. D. Wieck. “Laterally Resolved Doping by Focused Ion Beam Implantation.” In IECON Proc. , 1878, 2000.
D. Reuter, C. Meier, M. A. Alvarez, J. Koch, and A. D. Wieck, “Laterally resolved doping by focused ion beam implantation,” in IECON Proc. , 2000, p. 1878.
Reuter, D., et al. “Laterally Resolved Doping by Focused Ion Beam Implantation.” IECON Proc. , 2000, p. 1878.

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