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21 Publications
2016 | Journal Article | LibreCat-ID: 22675
Böke F, Giner I, Keller A, Grundmeier G, Fischer H. Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) yields better Hydrolytical Stability of Biocompatible SiOx Thin Films on Implant Alumina Ceramics compared to Rapid Thermal Evaporation Physical Vapor Deposition (PVD). ACS Applied Materials & Interfaces. 2016;8:17805-17816. doi:10.1021/acsami.6b04421
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