On the origin of resonance features in reflectance difference data of silicon

K. Hingerl, R.. Balderas-Navarro, A. Bonanni, P. Tichopadek, W. Schmidt, Applied Surface Science 175–176 (2002) 769–776.

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Journal Article | Published | English
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Journal Title
Applied Surface Science
Volume
175-176
Page
769-776
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Hingerl K, Balderas-Navarro R., Bonanni A, Tichopadek P, Schmidt W. On the origin of resonance features in reflectance difference data of silicon. Applied Surface Science. 2002;175-176:769-776. doi:10.1016/s0169-4332(01)00114-3
Hingerl, K., Balderas-Navarro, R. ., Bonanni, A., Tichopadek, P., & Schmidt, W. (2002). On the origin of resonance features in reflectance difference data of silicon. Applied Surface Science, 175176, 769–776. https://doi.org/10.1016/s0169-4332(01)00114-3
@article{Hingerl_Balderas-Navarro_Bonanni_Tichopadek_Schmidt_2002, title={On the origin of resonance features in reflectance difference data of silicon}, volume={175–176}, DOI={10.1016/s0169-4332(01)00114-3}, journal={Applied Surface Science}, author={Hingerl, K and Balderas-Navarro, R.E and Bonanni, A and Tichopadek, P and Schmidt, Wolf}, year={2002}, pages={769–776} }
Hingerl, K, R.E Balderas-Navarro, A Bonanni, P Tichopadek, and Wolf Schmidt. “On the Origin of Resonance Features in Reflectance Difference Data of Silicon.” Applied Surface Science 175–176 (2002): 769–76. https://doi.org/10.1016/s0169-4332(01)00114-3.
K. Hingerl, R. . Balderas-Navarro, A. Bonanni, P. Tichopadek, and W. Schmidt, “On the origin of resonance features in reflectance difference data of silicon,” Applied Surface Science, vol. 175–176, pp. 769–776, 2002.
Hingerl, K., et al. “On the Origin of Resonance Features in Reflectance Difference Data of Silicon.” Applied Surface Science, vol. 175–176, 2002, pp. 769–76, doi:10.1016/s0169-4332(01)00114-3.

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