Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms
C. Hoppe, F. Mitschker, I. Giner, M.T. de los Arcos de Pedro, P. Awakowicz, G. Grundmeier, Journal of Physics D: Applied Physics (2017).
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Journal Article
| Published
| English
Author
Hoppe, C;
Mitschker, F;
Giner, I;
de los Arcos de Pedro, Maria TeresaLibreCat;
Awakowicz, P;
Grundmeier, G
Department
Publishing Year
Journal Title
Journal of Physics D: Applied Physics
Article Number
204002
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Hoppe C, Mitschker F, Giner I, de los Arcos de Pedro MT, Awakowicz P, Grundmeier G. Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms. Journal of Physics D: Applied Physics. Published online 2017. doi:10.1088/1361-6463/aa69e5
Hoppe, C., Mitschker, F., Giner, I., de los Arcos de Pedro, M. T., Awakowicz, P., & Grundmeier, G. (2017). Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms. Journal of Physics D: Applied Physics, Article 204002. https://doi.org/10.1088/1361-6463/aa69e5
@article{Hoppe_Mitschker_Giner_de los Arcos de Pedro_Awakowicz_Grundmeier_2017, title={Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms}, DOI={10.1088/1361-6463/aa69e5}, number={204002}, journal={Journal of Physics D: Applied Physics}, author={Hoppe, C and Mitschker, F and Giner, I and de los Arcos de Pedro, Maria Teresa and Awakowicz, P and Grundmeier, G}, year={2017} }
Hoppe, C, F Mitschker, I Giner, Maria Teresa de los Arcos de Pedro, P Awakowicz, and G Grundmeier. “Influence of Organic Surface Chemistry on the Nucleation of Plasma Deposited SiOxfilms.” Journal of Physics D: Applied Physics, 2017. https://doi.org/10.1088/1361-6463/aa69e5.
C. Hoppe, F. Mitschker, I. Giner, M. T. de los Arcos de Pedro, P. Awakowicz, and G. Grundmeier, “Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms,” Journal of Physics D: Applied Physics, Art. no. 204002, 2017, doi: 10.1088/1361-6463/aa69e5.
Hoppe, C., et al. “Influence of Organic Surface Chemistry on the Nucleation of Plasma Deposited SiOxfilms.” Journal of Physics D: Applied Physics, 204002, 2017, doi:10.1088/1361-6463/aa69e5.
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