MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics
N.B. Srinivasan, T.B. Thiede, M.T. de los Arcos de Pedro, D. Rogalla, H.-W. Becker, A. Devi, R.A. Fischer, Physica Status Solidi (a) (2013) 260–266.
Download
No fulltext has been uploaded.
Journal Article
| Published
| English
Author
Srinivasan, Nagendra B.;
Thiede, Tobias B.;
de los Arcos de Pedro, Maria TeresaLibreCat;
Rogalla, Detlef;
Becker, Hans-Werner;
Devi, Anjana;
Fischer, Roland A.
Department
Publishing Year
Journal Title
physica status solidi (a)
Page
260-266
ISSN
LibreCat-ID
Cite this
Srinivasan NB, Thiede TB, de los Arcos de Pedro MT, et al. MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics. physica status solidi (a). Published online 2013:260-266. doi:10.1002/pssa.201330127
Srinivasan, N. B., Thiede, T. B., de los Arcos de Pedro, M. T., Rogalla, D., Becker, H.-W., Devi, A., & Fischer, R. A. (2013). MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics. Physica Status Solidi (a), 260–266. https://doi.org/10.1002/pssa.201330127
@article{Srinivasan_Thiede_de los Arcos de Pedro_Rogalla_Becker_Devi_Fischer_2013, title={MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics}, DOI={10.1002/pssa.201330127}, journal={physica status solidi (a)}, author={Srinivasan, Nagendra B. and Thiede, Tobias B. and de los Arcos de Pedro, Maria Teresa and Rogalla, Detlef and Becker, Hans-Werner and Devi, Anjana and Fischer, Roland A.}, year={2013}, pages={260–266} }
Srinivasan, Nagendra B., Tobias B. Thiede, Maria Teresa de los Arcos de Pedro, Detlef Rogalla, Hans-Werner Becker, Anjana Devi, and Roland A. Fischer. “MOCVD of Tungsten Nitride Thin Films: Comparison of Precursor Performance and Film Characteristics.” Physica Status Solidi (a), 2013, 260–66. https://doi.org/10.1002/pssa.201330127.
N. B. Srinivasan et al., “MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics,” physica status solidi (a), pp. 260–266, 2013, doi: 10.1002/pssa.201330127.
Srinivasan, Nagendra B., et al. “MOCVD of Tungsten Nitride Thin Films: Comparison of Precursor Performance and Film Characteristics.” Physica Status Solidi (a), 2013, pp. 260–66, doi:10.1002/pssa.201330127.
Google Scholar