Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum

A. Will, M.T. de los Arcos de Pedro, C. Corbella, A. Hecimovic, P.D. Machura, J. Winter, A. von Keudell, Journal of Physics D: Applied Physics (2013).

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Journal Article | Published | English
Author
Will, Andreas; de los Arcos de Pedro, Maria TeresaLibreCat; Corbella, Carles; Hecimovic, Ante; Machura, Patrick D; Winter, Jörg; von Keudell, Achim
Publishing Year
Journal Title
Journal of Physics D: Applied Physics
Article Number
084009
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Will A, de los Arcos de Pedro MT, Corbella C, et al. Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum. Journal of Physics D: Applied Physics. Published online 2013. doi:10.1088/0022-3727/46/8/084009
Will, A., de los Arcos de Pedro, M. T., Corbella, C., Hecimovic, A., Machura, P. D., Winter, J., & von Keudell, A. (2013). Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum. Journal of Physics D: Applied Physics, Article 084009. https://doi.org/10.1088/0022-3727/46/8/084009
@article{Will_de los Arcos de Pedro_Corbella_Hecimovic_Machura_Winter_von Keudell_2013, title={Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum}, DOI={10.1088/0022-3727/46/8/084009}, number={084009}, journal={Journal of Physics D: Applied Physics}, author={Will, Andreas and de los Arcos de Pedro, Maria Teresa and Corbella, Carles and Hecimovic, Ante and Machura, Patrick D and Winter, Jörg and von Keudell, Achim}, year={2013} }
Will, Andreas, Maria Teresa de los Arcos de Pedro, Carles Corbella, Ante Hecimovic, Patrick D Machura, Jörg Winter, and Achim von Keudell. “Target Implantation and Redeposition Processes during High-Power Impulse Magnetron Sputtering of Aluminum.” Journal of Physics D: Applied Physics, 2013. https://doi.org/10.1088/0022-3727/46/8/084009.
A. Will et al., “Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum,” Journal of Physics D: Applied Physics, Art. no. 084009, 2013, doi: 10.1088/0022-3727/46/8/084009.
Will, Andreas, et al. “Target Implantation and Redeposition Processes during High-Power Impulse Magnetron Sputtering of Aluminum.” Journal of Physics D: Applied Physics, 084009, 2013, doi:10.1088/0022-3727/46/8/084009.

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