Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms
C. Hoppe, F. Mitschker, I. Giner, T. de los Arcos, P. Awakowicz, G. Grundmeier, Journal of Physics D: Applied Physics (2017).
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Journal Article
| Published
| English
Author
Hoppe, ChristianLibreCat;
Mitschker, F;
Giner, I;
de los Arcos, T;
Awakowicz, P;
Grundmeier, GuidoLibreCat
Publishing Year
Journal Title
Journal of Physics D: Applied Physics
Article Number
204002
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Hoppe C, Mitschker F, Giner I, de los Arcos T, Awakowicz P, Grundmeier G. Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms. Journal of Physics D: Applied Physics. 2017. doi:10.1088/1361-6463/aa69e5
Hoppe, C., Mitschker, F., Giner, I., de los Arcos, T., Awakowicz, P., & Grundmeier, G. (2017). Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms. Journal of Physics D: Applied Physics. https://doi.org/10.1088/1361-6463/aa69e5
@article{Hoppe_Mitschker_Giner_de los Arcos_Awakowicz_Grundmeier_2017, title={Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms}, DOI={10.1088/1361-6463/aa69e5}, number={204002}, journal={Journal of Physics D: Applied Physics}, author={Hoppe, Christian and Mitschker, F and Giner, I and de los Arcos, T and Awakowicz, P and Grundmeier, Guido}, year={2017} }
Hoppe, Christian, F Mitschker, I Giner, T de los Arcos, P Awakowicz, and Guido Grundmeier. “Influence of Organic Surface Chemistry on the Nucleation of Plasma Deposited SiOxfilms.” Journal of Physics D: Applied Physics, 2017. https://doi.org/10.1088/1361-6463/aa69e5.
C. Hoppe, F. Mitschker, I. Giner, T. de los Arcos, P. Awakowicz, and G. Grundmeier, “Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms,” Journal of Physics D: Applied Physics, 2017.
Hoppe, Christian, et al. “Influence of Organic Surface Chemistry on the Nucleation of Plasma Deposited SiOxfilms.” Journal of Physics D: Applied Physics, 204002, 2017, doi:10.1088/1361-6463/aa69e5.
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