Oligothiophene Phosphonic Acids for Self-Assembled Monolayer Field-Effect Transistors

B. Zhao, B. Gothe, A. Groh, T. Schmaltz, J. Will, H.-G. Steinrück, T. Unruh, S. Mecking, M. Halik, ACS Applied Materials & Interfaces 13 (2021) 32461–32466.

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Journal Article | Published | English
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ACS Applied Materials & Interfaces
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13
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32461-32466
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Zhao B, Gothe B, Groh A, et al. Oligothiophene Phosphonic Acids for Self-Assembled Monolayer Field-Effect Transistors. ACS Applied Materials & Interfaces. 2021;13:32461-32466. doi:10.1021/acsami.1c05764
Zhao, B., Gothe, B., Groh, A., Schmaltz, T., Will, J., Steinrück, H.-G., Unruh, T., Mecking, S., & Halik, M. (2021). Oligothiophene Phosphonic Acids for Self-Assembled Monolayer Field-Effect Transistors. ACS Applied Materials & Interfaces, 13, 32461–32466. https://doi.org/10.1021/acsami.1c05764
@article{Zhao_Gothe_Groh_Schmaltz_Will_Steinrück_Unruh_Mecking_Halik_2021, title={Oligothiophene Phosphonic Acids for Self-Assembled Monolayer Field-Effect Transistors}, volume={13}, DOI={10.1021/acsami.1c05764}, journal={ACS Applied Materials & Interfaces}, author={Zhao, Baolin and Gothe, Bastian and Groh, Arthur and Schmaltz, Thomas and Will, Johannes and Steinrück, Hans-Georg and Unruh, Tobias and Mecking, Stefan and Halik, Marcus}, year={2021}, pages={32461–32466} }
Zhao, Baolin, Bastian Gothe, Arthur Groh, Thomas Schmaltz, Johannes Will, Hans-Georg Steinrück, Tobias Unruh, Stefan Mecking, and Marcus Halik. “Oligothiophene Phosphonic Acids for Self-Assembled Monolayer Field-Effect Transistors.” ACS Applied Materials & Interfaces 13 (2021): 32461–66. https://doi.org/10.1021/acsami.1c05764.
B. Zhao et al., “Oligothiophene Phosphonic Acids for Self-Assembled Monolayer Field-Effect Transistors,” ACS Applied Materials & Interfaces, vol. 13, pp. 32461–32466, 2021, doi: 10.1021/acsami.1c05764.
Zhao, Baolin, et al. “Oligothiophene Phosphonic Acids for Self-Assembled Monolayer Field-Effect Transistors.” ACS Applied Materials & Interfaces, vol. 13, 2021, pp. 32461–66, doi:10.1021/acsami.1c05764.

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