AFM-IR investigation of thin PECVD SiO x films on a polypropylene substrate in the surface-sensitive mode
H. Müller, H. Stadler, M.T. de los Arcos de Pedro, A. Keller, G. Grundmeier, Beilstein Journal of Nanotechnology 15 (2024) 603–611.
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Journal Article
| English
Author
Müller, Hendrik;
Stadler, Hartmut;
de los Arcos de Pedro, Maria TeresaLibreCat 
;
Keller, AdrianLibreCat ;
Grundmeier, GuidoLibreCat
;
Keller, AdrianLibreCat ;
Grundmeier, GuidoLibreCatDepartment
Abstract
AFM-IR investigation of thin PECVD SiOx films on a polypropylene substrate in the surface-sensitive mode
Publishing Year
Journal Title
Beilstein Journal of Nanotechnology
Volume
15
Issue
1
Page
603–611
ISSN
LibreCat-ID
Cite this
Müller H, Stadler H, de los Arcos de Pedro MT, Keller A, Grundmeier G. AFM-IR investigation of thin PECVD SiO x films on a polypropylene substrate in the surface-sensitive mode. Beilstein Journal of Nanotechnology. 2024;15(1):603–611. doi:10.3762/bjnano.15.51
Müller, H., Stadler, H., de los Arcos de Pedro, M. T., Keller, A., & Grundmeier, G. (2024). AFM-IR investigation of thin PECVD SiO x films on a polypropylene substrate in the surface-sensitive mode. Beilstein Journal of Nanotechnology, 15(1), 603–611. https://doi.org/10.3762/bjnano.15.51
@article{Müller_Stadler_de los Arcos de Pedro_Keller_Grundmeier_2024, title={AFM-IR investigation of thin PECVD SiO x films on a polypropylene substrate in the surface-sensitive mode}, volume={15}, DOI={10.3762/bjnano.15.51}, number={1}, journal={Beilstein Journal of Nanotechnology}, author={Müller, Hendrik and Stadler, Hartmut and de los Arcos de Pedro, Maria Teresa and Keller, Adrian and Grundmeier, Guido}, year={2024}, pages={603–611} }
Müller, Hendrik, Hartmut Stadler, Maria Teresa de los Arcos de Pedro, Adrian Keller, and Guido Grundmeier. “AFM-IR Investigation of Thin PECVD SiO x Films on a Polypropylene Substrate in the Surface-Sensitive Mode.” Beilstein Journal of Nanotechnology 15, no. 1 (2024): 603–611. https://doi.org/10.3762/bjnano.15.51.
H. Müller, H. Stadler, M. T. de los Arcos de Pedro, A. Keller, and G. Grundmeier, “AFM-IR investigation of thin PECVD SiO x films on a polypropylene substrate in the surface-sensitive mode,” Beilstein Journal of Nanotechnology, vol. 15, no. 1, pp. 603–611, 2024, doi: 10.3762/bjnano.15.51.
Müller, Hendrik, et al. “AFM-IR Investigation of Thin PECVD SiO x Films on a Polypropylene Substrate in the Surface-Sensitive Mode.” Beilstein Journal of Nanotechnology, vol. 15, no. 1, 2024, pp. 603–611, doi:10.3762/bjnano.15.51.
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