Engineering Disordered Many‐Particle Plasmonic Nanoclusters for Wafer‐Scale Uniform and Giant Electromagnetic Field Enhancement

Scalable plasmonic technologies face a critical trade‐off: few‐body architectures offer high enhancement but are sensitive to fabrication flaws, while scalable methods like solid‐state dewetting yield large, low‐enhancement gaps. We introduce a paradigm shift using a many‐body plasmonic architecture inspired by statistical mechanics. By moving toward the continuum limit, local geometric variations are statistically averaged out, effectively decoupling optical performance from microscopic disorder. We implement this concept via a lithography‐ and etching‐free, multi‐step dewetting strategy, creating wafer‐scale nanoclusters. This process strategically forms a robust many‐body system by introducing numerous small satellite nanoparticles between larger particles. Crucially, this design achieves a high collective enhancement that surpasses even optimized few‐body systems, despite having larger individual gaps. Under optimized conditions, these substrates exhibit a surface‐enhanced Raman scattering enhancement factor approaching 4 × 10^8 with unprecedented reproducibility (RSD of ∼10%). This scalable, low‐cost concept establishes a practical route toward reproducible wafer‐scale nanophotonic platforms for sensing, spectroscopy, and quantum technologies.