Automated SEM image analysis of the opening size distribution of nanosphere lithography masks and their origins
T. Riedl, J. Lindner, (2016).
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Conference Paper
| English
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contributed talk E.13.5
Conference
E-MRS Fall Meeting 2016
Conference Location
Warsaw (Poland)
Conference Date
2016-09-19 – 2016-09-22
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Riedl T, Lindner J. Automated SEM image analysis of the opening size distribution of nanosphere lithography masks and their origins . 2016.
Riedl, T., & Lindner, J. (2016). Automated SEM image analysis of the opening size distribution of nanosphere lithography masks and their origins . Presented at the E-MRS Fall Meeting 2016, Warsaw (Poland).
@article{Riedl_Lindner_2016, series={contributed talk E.13.5}, title={Automated SEM image analysis of the opening size distribution of nanosphere lithography masks and their origins }, author={Riedl, Thomas and Lindner, Jörg}, year={2016}, collection={contributed talk E.13.5} }
Riedl, Thomas, and Jörg Lindner. “Automated SEM Image Analysis of the Opening Size Distribution of Nanosphere Lithography Masks and Their Origins .” Contributed Talk E.13.5, 2016.
T. Riedl and J. Lindner, “Automated SEM image analysis of the opening size distribution of nanosphere lithography masks and their origins .” 2016.
Riedl, Thomas, and Jörg Lindner. Automated SEM Image Analysis of the Opening Size Distribution of Nanosphere Lithography Masks and Their Origins . 2016.
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