Molecular lithography with DNA nanostructures: Methods and applications

<jats:title>Abstract</jats:title> <jats:p>Lithographic surface patterning is a cornerstone of modern materials and device fabrication. Although the available lithography techniques are constantly being advanced to push the feature sizes down to the few-nanometer scale, such developments are associated with many technological and economic challenges. Combining established top-down lithography with bottom-up self-assembly strategies has the potential to overcome those challenges and enable the manipulation of matter with molecular precision. One of the most exciting approaches in this regard is to harness the programmability of DNA self-assembly to create precise DNA nanostructure masks to be used in the lithographic patterning of diverse substrates. DNA nanotechnology has provided us with a versatile toolbox for the high-yield synthesis of 2D and 3D nanostructures with complex, user-defined shapes at unprecedented molecular accuracy. Consequently, the last decade has seen intense research efforts aimed at transferring such DNA nanostructure shapes into functional organic and inorganic materials and we have now arrived at a point where sophisticated molecular lithography approaches utilize DNA nanostructure masks for the fabrication of plasmonic surfaces for metamaterials and sensing applications. This review summarizes how the spatial information of such DNA nanostructure masks can be transferred into various organic and inorganic materials through selective etching and deposition steps. The review also discusses recent developments toward all-purpose molecular lithography schemes and highlights promising extensions of the discussed methods toward new materials systems and application fields.</jats:p>