Fabrication of two-dimensional electron systems by focused ion beam doping of III/V semiconductor heterostructures

C. Meier, D. Reuter, C. Riedesel, A.D. Wieck, Journal of Applied Physics (2003) 6100–6106.

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Journal Article | Published | English
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Journal of Applied Physics
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6100-6106
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Meier C, Reuter D, Riedesel C, Wieck AD. Fabrication of two-dimensional electron systems by focused ion beam doping of III/V semiconductor heterostructures. Journal of Applied Physics. 2003:6100-6106. doi:10.1063/1.1563032
Meier, C., Reuter, D., Riedesel, C., & Wieck, A. D. (2003). Fabrication of two-dimensional electron systems by focused ion beam doping of III/V semiconductor heterostructures. Journal of Applied Physics, 6100–6106. https://doi.org/10.1063/1.1563032
@article{Meier_Reuter_Riedesel_Wieck_2003, title={Fabrication of two-dimensional electron systems by focused ion beam doping of III/V semiconductor heterostructures}, DOI={10.1063/1.1563032}, journal={Journal of Applied Physics}, author={Meier, Cedrik and Reuter, Dirk and Riedesel, Christof and Wieck, Andreas D.}, year={2003}, pages={6100–6106} }
Meier, Cedrik, Dirk Reuter, Christof Riedesel, and Andreas D. Wieck. “Fabrication of Two-Dimensional Electron Systems by Focused Ion Beam Doping of III/V Semiconductor Heterostructures.” Journal of Applied Physics, 2003, 6100–6106. https://doi.org/10.1063/1.1563032.
C. Meier, D. Reuter, C. Riedesel, and A. D. Wieck, “Fabrication of two-dimensional electron systems by focused ion beam doping of III/V semiconductor heterostructures,” Journal of Applied Physics, pp. 6100–6106, 2003.
Meier, Cedrik, et al. “Fabrication of Two-Dimensional Electron Systems by Focused Ion Beam Doping of III/V Semiconductor Heterostructures.” Journal of Applied Physics, 2003, pp. 6100–06, doi:10.1063/1.1563032.

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