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18 Publications


2002 | Journal Article | LibreCat-ID: 39882
V. Mankowski, U. Hilleringmann, and K. Schumacher, “A novel insulation technique for smart power switching devices and very high voltage ICs above 10 kV,” Microelectronic Engineering, vol. 53, no. 1–4, pp. 525–528, 2002, doi: 10.1016/s0167-9317(00)00370-1.
LibreCat | DOI
 

2002 | Journal Article | LibreCat-ID: 39879
J. T. Horstmann, U. Hilleringmann, and K. Goser, “1/f-Noise of sub-100 nm-MOS-transistors fabricated by a special deposition and etchback technique,” Microelectronic Engineering, vol. 53, no. 1–4, pp. 213–216, 2002, doi: 10.1016/s0167-9317(00)00299-9.
LibreCat | DOI
 

2002 | Journal Article | LibreCat-ID: 39919
U. Hilleringmann, K. Knospe, C. Heite, K. Schumacher, and K. Goser, “A silicon based technology for monolithic integration of waveguides and VLSI CMOS circuits,” Microelectronic Engineering, vol. 15, no. 1–4, pp. 289–292, 2002, doi: 10.1016/0167-9317(91)90231-2.
LibreCat | DOI
 

2002 | Journal Article | LibreCat-ID: 39920
A. Soennecken, U. Hilleringmann, and K. Goser, “Floating gate structures as nonvolatile analog memory cells in 1.0μm-LOCOS-CMOS technology with PZT dielectrica,” Microelectronic Engineering, vol. 15, no. 1–4, pp. 633–636, 2002, doi: 10.1016/0167-9317(91)90299-s.
LibreCat | DOI
 

2002 | Journal Article | LibreCat-ID: 39915
U. Hilleringmann and K. Goser, “Results of monolithic integration of optical waveguides, photodiodes and CMOS circuits on silicon,” Microelectronic Engineering, vol. 19, no. 1–4, pp. 211–214, 2002, doi: 10.1016/0167-9317(92)90425-q.
LibreCat | DOI
 

2002 | Journal Article | LibreCat-ID: 39916
S. Adams, U. Hilleringmann, and K. Goser, “CMOS compatible micromachining by dry silicon-etching techniques,” Microelectronic Engineering, vol. 19, no. 1–4, pp. 191–194, 2002, doi: 10.1016/0167-9317(92)90420-v.
LibreCat | DOI
 

2002 | Journal Article | LibreCat-ID: 39889
V. Mankowski, U. Hilleringmann, and K. Schumacher, “12 kV low current cascaded light triggered switch on one silicon chip,” Microelectronic Engineering, vol. 46, no. 1–4, pp. 413–417, 2002, doi: 10.1016/s0167-9317(99)00122-7.
LibreCat | DOI
 

2002 | Journal Article | LibreCat-ID: 39877
U. Hilleringmann, T. Vieregge, and J. T. Horstmann, “A structure definition technique for 25 nm lines of silicon and related materials,” Microelectronic Engineering, vol. 53, no. 1–4, pp. 569–572, 2002, doi: 10.1016/s0167-9317(00)00380-4.
LibreCat | DOI
 

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