9 Publications
2022 | Journal Article | LibreCat-ID: 34648
C. Hoppe et al., “Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO x thin films on PDMS,” Plasma Processes and Polymers, vol. 19, no. 4, Art. no. 2100174, 2022, doi: 10.1002/ppap.202100174.
LibreCat
| DOI
2021 | Journal Article | LibreCat-ID: 34645
T. S. Tripathi et al., “Atomic Layer Deposition of Copper Metal Films from Cu(acac) 2 and Hydroquinone Reductant,” Advanced Engineering Materials, vol. 23, no. 10, Art. no. 2100446, 2021, doi: 10.1002/adem.202100446.
LibreCat
| DOI
2019 | Journal Article | LibreCat-ID: 22833
L. Mai et al., “Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices,” ACS Applied Materials & Interfaces, pp. 3169–3180, 2019.
LibreCat
| DOI
9 Publications
2022 | Journal Article | LibreCat-ID: 34648
C. Hoppe et al., “Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO x thin films on PDMS,” Plasma Processes and Polymers, vol. 19, no. 4, Art. no. 2100174, 2022, doi: 10.1002/ppap.202100174.
LibreCat
| DOI
2021 | Journal Article | LibreCat-ID: 34645
T. S. Tripathi et al., “Atomic Layer Deposition of Copper Metal Films from Cu(acac) 2 and Hydroquinone Reductant,” Advanced Engineering Materials, vol. 23, no. 10, Art. no. 2100446, 2021, doi: 10.1002/adem.202100446.
LibreCat
| DOI
2019 | Journal Article | LibreCat-ID: 22833
L. Mai et al., “Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices,” ACS Applied Materials & Interfaces, pp. 3169–3180, 2019.
LibreCat
| DOI