Characterisation of micropores in plasma deposited SiO x films by means of positron annihilation lifetime spectroscopy

Hoppe, C., Mitschker, F., Butterling, M., Liedke, M. O., de los Arcos de Pedro, M. T., Awakowicz, P., Wagner, A., & Grundmeier, G. (2020). Characterisation of micropores in plasma deposited SiO x  films by means of positron annihilation lifetime spectroscopy. Journal of Physics D: Applied Physics, Article 475205. https://doi.org/10.1088/1361-6463/aba8ba

@article{Hoppe_Mitschker_Butterling_Liedke_de los Arcos de Pedro_Awakowicz_Wagner_Grundmeier_2020, title={Characterisation of micropores in plasma deposited SiO x  films by means of positron annihilation lifetime spectroscopy}, DOI={10.1088/1361-6463/aba8ba}, number={475205}, journal={Journal of Physics D: Applied Physics}, author={Hoppe, C and Mitschker, F and Butterling, M and Liedke, M O and de los Arcos de Pedro, Maria Teresa and Awakowicz, P and Wagner, A and Grundmeier, Guido}, year={2020} }

Hoppe, C, F Mitschker, M Butterling, M O Liedke, Maria Teresa de los Arcos de Pedro, P Awakowicz, A Wagner, and Guido Grundmeier. “Characterisation of Micropores in Plasma Deposited SiO x  Films by Means of Positron Annihilation Lifetime Spectroscopy.” Journal of Physics D: Applied Physics, 2020. https://doi.org/10.1088/1361-6463/aba8ba.

C. Hoppe et al., “Characterisation of micropores in plasma deposited SiO x  films by means of positron annihilation lifetime spectroscopy,” Journal of Physics D: Applied Physics, Art. no. 475205, 2020, doi: 10.1088/1361-6463/aba8ba.

Hoppe, C., et al. “Characterisation of Micropores in Plasma Deposited SiO x  Films by Means of Positron Annihilation Lifetime Spectroscopy.” Journal of Physics D: Applied Physics, 475205, 2020, doi:10.1088/1361-6463/aba8ba.