Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films
M. Mehta, M. Ruth, K.A. Piegdon, D. Krix, H. Nienhaus, C. Meier, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 27 (2009).
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Journal Article
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| English
Author
Mehta, M.;
Ruth, M.;
Piegdon, K. A.;
Krix, D.;
Nienhaus, H.;
Meier, CedrikLibreCat 
Department
Publishing Year
Journal Title
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Volume
27
Issue
5
Article Number
2097
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Mehta M, Ruth M, Piegdon KA, Krix D, Nienhaus H, Meier C. Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 2009;27(5). doi:10.1116/1.3186528
Mehta, M., Ruth, M., Piegdon, K. A., Krix, D., Nienhaus, H., & Meier, C. (2009). Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 27(5). https://doi.org/10.1116/1.3186528
@article{Mehta_Ruth_Piegdon_Krix_Nienhaus_Meier_2009, title={Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films}, volume={27}, DOI={10.1116/1.3186528}, number={52097}, journal={Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures}, publisher={American Vacuum Society}, author={Mehta, M. and Ruth, M. and Piegdon, K. A. and Krix, D. and Nienhaus, H. and Meier, Cedrik}, year={2009} }
Mehta, M., M. Ruth, K. A. Piegdon, D. Krix, H. Nienhaus, and Cedrik Meier. “Inductively Coupled Plasma Reactive Ion Etching of Bulk ZnO Single Crystal and Molecular Beam Epitaxy Grown ZnO Films.” Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 27, no. 5 (2009). https://doi.org/10.1116/1.3186528.
M. Mehta, M. Ruth, K. A. Piegdon, D. Krix, H. Nienhaus, and C. Meier, “Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films,” Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 27, no. 5, 2009.
Mehta, M., et al. “Inductively Coupled Plasma Reactive Ion Etching of Bulk ZnO Single Crystal and Molecular Beam Epitaxy Grown ZnO Films.” Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 27, no. 5, 2097, American Vacuum Society, 2009, doi:10.1116/1.3186528.
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