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9 Publications
2022 | Journal Article | LibreCat-ID: 34648
Hoppe, C., Mitschker, F., Mai, L., Liedke, M. O., Arcos, T., Awakowicz, P., Devi, A., Attallah, A. G., Butterling, M., Wagner, A., & Grundmeier, G. (2022). Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO x thin films on PDMS. Plasma Processes and Polymers, 19(4), Article 2100174. https://doi.org/10.1002/ppap.202100174
LibreCat
| DOI
2021 | Journal Article | LibreCat-ID: 34645
Tripathi, T. S., Wilken, M., Hoppe, C., de los Arcos, T., Grundmeier, G., Devi, A., & Karppinen, M. (2021). Atomic Layer Deposition of Copper Metal Films from Cu(acac) 2 and Hydroquinone Reductant. Advanced Engineering Materials, 23(10), Article 2100446. https://doi.org/10.1002/adem.202100446
LibreCat
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2019 | Journal Article | LibreCat-ID: 22833
Mai, L., Zanders, D., Subaşı, E., Ciftyurek, E., Hoppe, C., Rogalla, D., … Devi, A. (2019). Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices. ACS Applied Materials & Interfaces, 3169–3180. https://doi.org/10.1021/acsami.8b16443
LibreCat
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2018 | Journal Article | LibreCat-ID: 22839
Gebhard, M., Mitschker, F., Hoppe, C., Aghaee, M., Rogalla, D., Creatore, M., … Devi, A. (2018). A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD. Plasma Processes and Polymers. https://doi.org/10.1002/ppap.201700209
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2017 | Journal Article | LibreCat-ID: 22849
Hoppe, C., Mitschker, F., Giner, I., de los Arcos, T., Awakowicz, P., & Grundmeier, G. (2017). Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms. Journal of Physics D: Applied Physics. https://doi.org/10.1088/1361-6463/aa69e5
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