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9 Publications


2022 | Journal Article | LibreCat-ID: 34648
Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO x thin films on PDMS
C. Hoppe, F. Mitschker, L. Mai, M.O. Liedke, T. Arcos, P. Awakowicz, A. Devi, A.G. Attallah, M. Butterling, A. Wagner, G. Grundmeier, Plasma Processes and Polymers 19 (2022).
LibreCat | DOI
 

2021 | Journal Article | LibreCat-ID: 34645
Atomic Layer Deposition of Copper Metal Films from Cu(acac) 2 and Hydroquinone Reductant
T.S. Tripathi, M. Wilken, C. Hoppe, T. de los Arcos, G. Grundmeier, A. Devi, M. Karppinen, Advanced Engineering Materials 23 (2021).
LibreCat | DOI
 

2019 | Journal Article | LibreCat-ID: 22833
Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices
L. Mai, D. Zanders, E. Subaşı, E. Ciftyurek, C. Hoppe, D. Rogalla, W. Gilbert, T. de los Arcos, K. Schierbaum, G. Grundmeier, C. Bock, A. Devi, ACS Applied Materials & Interfaces (2019) 3169–3180.
LibreCat | DOI
 

2018 | Journal Article | LibreCat-ID: 22839
A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
M. Gebhard, F. Mitschker, C. Hoppe, M. Aghaee, D. Rogalla, M. Creatore, G. Grundmeier, P. Awakowicz, A. Devi, Plasma Processes and Polymers (2018).
LibreCat | DOI
 

2017 | Journal Article | LibreCat-ID: 22849
Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms
C. Hoppe, F. Mitschker, I. Giner, T. de los Arcos, P. Awakowicz, G. Grundmeier, Journal of Physics D: Applied Physics (2017).
LibreCat | DOI
 

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