Massive Statistical Process Variations - A Grand Challenge for Testing Nanoelectronic Circuits
B. Becker, S. Hellebrand, I. Polian, B. Straube, W. Vermeiren, H.-J. Wunderlich, in: 40th Annual IEEE/IFIP International Conference on Dependable Systems and Networks Workshops (DSN-W’10), IEEE, Chicago, IL, USA, 2010.
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Becker, Bernd;
Hellebrand, SybilleLibreCat 
;
Polian, Ilia;
Straube, Bernd;
Vermeiren, Wolfgang;
Wunderlich, Hans-Joachim
;
Polian, Ilia;
Straube, Bernd;
Vermeiren, Wolfgang;
Wunderlich, Hans-JoachimDepartment
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40th Annual IEEE/IFIP International Conference on Dependable Systems and Networks Workshops (DSN-W'10)
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Becker B, Hellebrand S, Polian I, Straube B, Vermeiren W, Wunderlich H-J. Massive Statistical Process Variations - A Grand Challenge for Testing Nanoelectronic Circuits. In: 40th Annual IEEE/IFIP International Conference on Dependable Systems and Networks Workshops (DSN-W’10). Chicago, IL, USA: IEEE; 2010. doi:10.1109/dsnw.2010.5542612
Becker, B., Hellebrand, S., Polian, I., Straube, B., Vermeiren, W., & Wunderlich, H.-J. (2010). Massive Statistical Process Variations - A Grand Challenge for Testing Nanoelectronic Circuits. In 40th Annual IEEE/IFIP International Conference on Dependable Systems and Networks Workshops (DSN-W’10). Chicago, IL, USA: IEEE. https://doi.org/10.1109/dsnw.2010.5542612
@inproceedings{Becker_Hellebrand_Polian_Straube_Vermeiren_Wunderlich_2010, place={Chicago, IL, USA}, title={Massive Statistical Process Variations - A Grand Challenge for Testing Nanoelectronic Circuits}, DOI={10.1109/dsnw.2010.5542612}, booktitle={40th Annual IEEE/IFIP International Conference on Dependable Systems and Networks Workshops (DSN-W’10)}, publisher={IEEE}, author={Becker, Bernd and Hellebrand, Sybille and Polian, Ilia and Straube, Bernd and Vermeiren, Wolfgang and Wunderlich, Hans-Joachim}, year={2010} }
Becker, Bernd, Sybille Hellebrand, Ilia Polian, Bernd Straube, Wolfgang Vermeiren, and Hans-Joachim Wunderlich. “Massive Statistical Process Variations - A Grand Challenge for Testing Nanoelectronic Circuits.” In 40th Annual IEEE/IFIP International Conference on Dependable Systems and Networks Workshops (DSN-W’10). Chicago, IL, USA: IEEE, 2010. https://doi.org/10.1109/dsnw.2010.5542612.
B. Becker, S. Hellebrand, I. Polian, B. Straube, W. Vermeiren, and H.-J. Wunderlich, “Massive Statistical Process Variations - A Grand Challenge for Testing Nanoelectronic Circuits,” in 40th Annual IEEE/IFIP International Conference on Dependable Systems and Networks Workshops (DSN-W’10), 2010.
Becker, Bernd, et al. “Massive Statistical Process Variations - A Grand Challenge for Testing Nanoelectronic Circuits.” 40th Annual IEEE/IFIP International Conference on Dependable Systems and Networks Workshops (DSN-W’10), IEEE, 2010, doi:10.1109/dsnw.2010.5542612.
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