An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor

M. Gebhard, F. Mitschker, M. Wiesing, I. Giner, B. Torun, T. de los Arcos, P. Awakowicz, G. Grundmeier, A. Devi, Journal of Materials Chemistry C (2016) 1057–1065.

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Journal Article | Published | English
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<p>A new Ti-precursor for low-temperature PE-ALD of titanium dioxide thin films as gas barrier layers on polymer substrates.</p>
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Journal of Materials Chemistry C
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1057-1065
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Gebhard M, Mitschker F, Wiesing M, et al. An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor. Journal of Materials Chemistry C. 2016:1057-1065. doi:10.1039/c5tc03385c
Gebhard, M., Mitschker, F., Wiesing, M., Giner, I., Torun, B., de los Arcos, T., … Devi, A. (2016). An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor. Journal of Materials Chemistry C, 1057–1065. https://doi.org/10.1039/c5tc03385c
@article{Gebhard_Mitschker_Wiesing_Giner_Torun_de los Arcos_Awakowicz_Grundmeier_Devi_2016, title={An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor}, DOI={10.1039/c5tc03385c}, journal={Journal of Materials Chemistry C}, author={Gebhard, M. and Mitschker, F. and Wiesing, M. and Giner, I. and Torun, B. and de los Arcos, T. and Awakowicz, P. and Grundmeier, G. and Devi, A.}, year={2016}, pages={1057–1065} }
Gebhard, M., F. Mitschker, M. Wiesing, I. Giner, B. Torun, T. de los Arcos, P. Awakowicz, G. Grundmeier, and A. Devi. “An Efficient PE-ALD Process for TiO2 Thin Films Employing a New Ti-Precursor.” Journal of Materials Chemistry C, 2016, 1057–65. https://doi.org/10.1039/c5tc03385c.
M. Gebhard et al., “An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor,” Journal of Materials Chemistry C, pp. 1057–1065, 2016.
Gebhard, M., et al. “An Efficient PE-ALD Process for TiO2 Thin Films Employing a New Ti-Precursor.” Journal of Materials Chemistry C, 2016, pp. 1057–65, doi:10.1039/c5tc03385c.

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