Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors

Srinivasan, N. B., Thiede, T. B., de los Arcos de Pedro, M. T., Gwildies, V., Krasnopolski, M., Becker, H.-W., Rogalla, D., Devi, A., & Fischer, R. A. (2013). Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors. Surface and Coatings Technology, 130–136. https://doi.org/10.1016/j.surfcoat.2013.06.024

@article{Srinivasan_Thiede_de los Arcos de Pedro_Gwildies_Krasnopolski_Becker_Rogalla_Devi_Fischer_2013, title={Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors}, DOI={10.1016/j.surfcoat.2013.06.024}, journal={Surface and Coatings Technology}, author={Srinivasan, N.B. and Thiede, T.B. and de los Arcos de Pedro, Maria Teresa and Gwildies, V. and Krasnopolski, M. and Becker, H.-W. and Rogalla, D. and Devi, A. and Fischer, R.A.}, year={2013}, pages={130–136} }

Srinivasan, N.B., T.B. Thiede, Maria Teresa de los Arcos de Pedro, V. Gwildies, M. Krasnopolski, H.-W. Becker, D. Rogalla, A. Devi, and R.A. Fischer. “Transition Metal Nitride Thin Films Grown by MOCVD Using Amidinato Based Complexes [M(NtBu)2{(IPrN)2CMe}2] (M=Mo, W) as Precursors.” Surface and Coatings Technology, 2013, 130–36. https://doi.org/10.1016/j.surfcoat.2013.06.024.

N. B. Srinivasan et al., “Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors,” Surface and Coatings Technology, pp. 130–136, 2013, doi: 10.1016/j.surfcoat.2013.06.024.

Srinivasan, N. B., et al. “Transition Metal Nitride Thin Films Grown by MOCVD Using Amidinato Based Complexes [M(NtBu)2{(IPrN)2CMe}2] (M=Mo, W) as Precursors.” Surface and Coatings Technology, 2013, pp. 130–36, doi:10.1016/j.surfcoat.2013.06.024.