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18 Publications
2017 | Journal Article | LibreCat-ID: 7026
Zolatanosha V, Reuter D. Robust Si 3 N 4 masks for 100 nm selective area epitaxy of GaAs-based nanostructures. Microelectronic Engineering. 2017;180:35-39. doi:10.1016/j.mee.2017.05.053
LibreCat
| DOI
2016 | Journal Article | LibreCat-ID: 3956
Meyers T, Vidor FF, Brassat K, Lindner J, Hilleringmann U. Low-voltage DNTT-based thin-film transistors and inverters for flexible electronics. Microelectronic Engineering. 2016;174:35-39. doi:10.1016/j.mee.2016.12.018
LibreCat
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| DOI
2016 | Journal Article | LibreCat-ID: 39447
Meyers T, Vidor FF, Brassat K, Lindner JKN, Hilleringmann U. Low-voltage DNTT-based thin-film transistors and inverters for flexible electronics. Microelectronic Engineering. 2016;174:35-39. doi:10.1016/j.mee.2016.12.018
LibreCat
| DOI
2016 | Journal Article | LibreCat-ID: 39466
Vidor FF, Meyers T, Wirth GI, Hilleringmann U. ZnO nanoparticle thin-film transistors on flexible substrate using spray-coating technique. Microelectronic Engineering. 2016;159:155-158. doi:10.1016/j.mee.2016.02.059
LibreCat
| DOI
2003 | Journal Article | LibreCat-ID: 8728
Zankovych S, Maximov I, Shorubalko I, et al. Nanoimprint-induced effects on electrical and optical properties of quantum well structures. Microelectronic Engineering. 2003:214-220. doi:10.1016/s0167-9317(03)00074-1
LibreCat
| DOI
2003 | Journal Article | LibreCat-ID: 39851
Pannemann Ch, Diekmann T, Hilleringmann U. Nanometer scale organic thin film transistors with Pentacene. Microelectronic Engineering. 2003;67-68:845-852. doi:10.1016/s0167-9317(03)00146-1
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 8733
Kähler D, Kunze U, Reuter D, Wieck AD. Quantum wire fabrication from compensating-layer GaAs–AlGaAs heterostructures. Microelectronic Engineering. 2002:619-623. doi:10.1016/s0167-9317(02)00474-4
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39912
Schönstein I, Müller J, Hilleringmann U, Goser K. Characterization of submicron NMOS devices due to visible light emission. Microelectronic Engineering. 2002;21(1-4):363-366. doi:10.1016/0167-9317(93)90092-j
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39914
Hilleringmann U, Goser K. Results of monolithic integration of optical waveguides, photodiodes and CMOS circuits on silicon. Microelectronic Engineering. 2002;19(1-4):211-214. doi:10.1016/0167-9317(92)90425-q
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39899
Horstmann JT, Hilleringmann U, Goser K. Characterisation of sub-100 nm-MOS-transistors processed by optical lithography and a sidewall-etchback technique. Microelectronic Engineering. 2002;30(1-4):431-434. doi:10.1016/0167-9317(95)00280-4
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| DOI