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18 Publications


2017 | Journal Article | LibreCat-ID: 7026
@article{Zolatanosha_Reuter_2017, title={Robust Si 3 N 4 masks for 100 nm selective area epitaxy of GaAs-based nanostructures}, volume={180}, DOI={10.1016/j.mee.2017.05.053}, journal={Microelectronic Engineering}, publisher={Elsevier BV}, author={Zolatanosha, Viktoryia and Reuter, Dirk}, year={2017}, pages={35–39} }
LibreCat | DOI
 

2016 | Journal Article | LibreCat-ID: 3956
@article{Meyers_Vidor_Brassat_Lindner_Hilleringmann_2016, title={Low-voltage DNTT-based thin-film transistors and inverters for flexible electronics}, volume={174}, DOI={10.1016/j.mee.2016.12.018}, journal={Microelectronic Engineering}, publisher={Elsevier BV}, author={Meyers, Thorsten and Vidor, Fábio F. and Brassat, Katharina and Lindner, Jörg and Hilleringmann, Ulrich}, year={2016}, pages={35–39} }
LibreCat | Files available | DOI
 

2016 | Journal Article | LibreCat-ID: 39447
@article{Meyers_Vidor_Brassat_Lindner_Hilleringmann_2016, title={Low-voltage DNTT-based thin-film transistors and inverters for flexible electronics}, volume={174}, DOI={10.1016/j.mee.2016.12.018}, journal={Microelectronic Engineering}, publisher={Elsevier BV}, author={Meyers, Thorsten and Vidor, Fábio F. and Brassat, Katharina and Lindner, Jörg K.N. and Hilleringmann, Ulrich}, year={2016}, pages={35–39} }
LibreCat | DOI
 

2016 | Journal Article | LibreCat-ID: 39466
@article{Vidor_Meyers_Wirth_Hilleringmann_2016, title={ZnO nanoparticle thin-film transistors on flexible substrate using spray-coating technique}, volume={159}, DOI={10.1016/j.mee.2016.02.059}, journal={Microelectronic Engineering}, publisher={Elsevier BV}, author={Vidor, Fábio F. and Meyers, Thorsten and Wirth, Gilson I. and Hilleringmann, Ulrich}, year={2016}, pages={155–158} }
LibreCat | DOI
 

2003 | Journal Article | LibreCat-ID: 8728
@article{Zankovych_Maximov_Shorubalko_Seekamp_Beck_Romanov_Reuter_Schafmeister_Wieck_Ahopelto_et al._2003, title={Nanoimprint-induced effects on electrical and optical properties of quantum well structures}, DOI={10.1016/s0167-9317(03)00074-1}, journal={Microelectronic Engineering}, author={Zankovych, S. and Maximov, I. and Shorubalko, I. and Seekamp, J. and Beck, M. and Romanov, S. and Reuter, Dirk and Schafmeister, P. and Wieck, A.D. and Ahopelto, J. and et al.}, year={2003}, pages={214–220} }
LibreCat | DOI
 

2003 | Journal Article | LibreCat-ID: 39851
@article{Pannemann_Diekmann_Hilleringmann_2003, title={Nanometer scale organic thin film transistors with Pentacene}, volume={67–68}, DOI={10.1016/s0167-9317(03)00146-1}, journal={Microelectronic Engineering}, publisher={Elsevier BV}, author={Pannemann, Ch. and Diekmann, T. and Hilleringmann, Ulrich}, year={2003}, pages={845–852} }
LibreCat | DOI
 

2002 | Journal Article | LibreCat-ID: 8733
@article{Kähler_Kunze_Reuter_Wieck_2002, title={Quantum wire fabrication from compensating-layer GaAs–AlGaAs heterostructures}, DOI={10.1016/s0167-9317(02)00474-4}, journal={Microelectronic Engineering}, author={Kähler, D. and Kunze, U. and Reuter, Dirk and Wieck, A.D.}, year={2002}, pages={619–623} }
LibreCat | DOI
 

2002 | Journal Article | LibreCat-ID: 39912
@article{Schönstein_Müller_Hilleringmann_Goser_2002, title={Characterization of submicron NMOS devices due to visible light emission}, volume={21}, DOI={10.1016/0167-9317(93)90092-j}, number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV}, author={Schönstein, I. and Müller, J. and Hilleringmann, Ulrich and Goser, K.}, year={2002}, pages={363–366} }
LibreCat | DOI
 

2002 | Journal Article | LibreCat-ID: 39914
@article{Hilleringmann_Goser_2002, title={Results of monolithic integration of optical waveguides, photodiodes and CMOS circuits on silicon}, volume={19}, DOI={10.1016/0167-9317(92)90425-q}, number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV}, author={Hilleringmann, Ulrich and Goser, K.}, year={2002}, pages={211–214} }
LibreCat | DOI
 

2002 | Journal Article | LibreCat-ID: 39899
@article{Horstmann_Hilleringmann_Goser_2002, title={Characterisation of sub-100 nm-MOS-transistors processed by optical lithography and a sidewall-etchback technique}, volume={30}, DOI={10.1016/0167-9317(95)00280-4}, number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV}, author={Horstmann, J.T. and Hilleringmann, Ulrich and Goser, K.}, year={2002}, pages={431–434} }
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