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113 Publications
2016 | Journal Article | LibreCat-ID: 22574
Bobzin, K., et al. “(Cr,Al)N/(Cr,Al)ON Oxy-Nitride Coatings Deposited by Hybrid DcMS/HPPMS for Plastics Processing Applications.” Surface and Coatings Technology, 2016, pp. 394–403, doi:10.1016/j.surfcoat.2016.07.093.
LibreCat
| DOI
2016 | Journal Article | LibreCat-ID: 22567
Hunold, Oliver, et al. “Influence of O2 Exposure on the Interaction between CH4 and Amorphous AlYB14.” Applied Surface Science, 2016, pp. 1165–72, doi:10.1016/j.apsusc.2016.09.092.
LibreCat
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2016 | Journal Article | LibreCat-ID: 22576
Corbella, Carles, et al. “Revising Secondary Electron Yields of Ion-Sputtered Metal Oxides.” Journal of Physics D: Applied Physics, 16LT01, 2016, doi:10.1088/0022-3727/49/16/16lt01.
LibreCat
| DOI
2016 | Journal Article | LibreCat-ID: 22577
Gebhard, M., et al. “An Efficient PE-ALD Process for TiO2 Thin Films Employing a New Ti-Precursor.” Journal of Materials Chemistry C, 2016, pp. 1057–65, doi:10.1039/c5tc03385c.
LibreCat
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2016 | Journal Article | LibreCat-ID: 22578
Wiesing, Martin, et al. “Combined Electrochemical and Electron Spectroscopic Investigations of the Surface Oxidation of TiAlN HPPMS Hard Coatings.” Electrochimica Acta, 2016, pp. 120–28, doi:10.1016/j.electacta.2016.05.011.
LibreCat
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2015 | Journal Article | LibreCat-ID: 22579
Grundmeier, Guido, et al. “Fundamentals and Applications of Reflection FTIR Spectroscopy for the Analysis of Plasma Processes at Materials Interfaces.” Plasma Processes and Polymers, 2015, pp. 926–40, doi:10.1002/ppap.201500087.
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2015 | Journal Article | LibreCat-ID: 22582
Mitschker, Felix, et al. “Spectroscopic and Microscopic Investigations of Degradation Processes in Polymer Surface-Near Regions During the Deposition of SiOx Films.” Plasma Processes and Polymers, 2015, pp. 1002–09, doi:10.1002/ppap.201500085.
LibreCat
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2015 | Journal Article | LibreCat-ID: 22583
Schröder, Daniel, et al. “Characteristics of a Propagating, Self-Pulsing, Constricted ‘γ-Mode-like’ Discharge.” Journal of Physics D: Applied Physics, 055206, 2015, doi:10.1088/0022-3727/48/5/055206.
LibreCat
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2015 | Journal Article | LibreCat-ID: 22581
Marcak, Adrian, et al. “Note: Ion-Induced Secondary Electron Emission from Oxidized Metal Surfaces Measured in a Particle Beam Reactor.” Review of Scientific Instruments, 106102, 2015, doi:10.1063/1.4932309.
LibreCat
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2014 | Journal Article | LibreCat-ID: 22580
König, Dennis, et al. “X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction Layer and Its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape Memory Thin Films.” Advanced Engineering Materials, 2014, pp. 669–73, doi:10.1002/adem.201400317.
LibreCat
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2014 | Journal Article | LibreCat-ID: 22585
de los Arcos de Pedro, Maria Teresa, et al. “Description of HiPIMS Plasma Regimes in Terms of Composition, Spoke Formation and Deposition Rate.” Plasma Sources Science and Technology, 054008, 2014, doi:10.1088/0963-0252/23/5/054008.
LibreCat
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2014 | Journal Article | LibreCat-ID: 22586
Eren, Baran, et al. “Carbon Nanotube Growth on AlN Support: Comparison between Ni and Fe Chemical States and Morphology.” Chemical Physics Letters, 2014, pp. 82–87, doi:10.1016/j.cplett.2014.06.042.
LibreCat
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2014 | Journal Article | LibreCat-ID: 22587
Machura, P. D., et al. “Simultaneous Characterization of Static and Induced Magnetic Fields in High Power Impulse Magnetron Sputtering Discharges.” Plasma Sources Science and Technology, 065043, 2014, doi:10.1088/0963-0252/23/6/065043.
LibreCat
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2014 | Journal Article | LibreCat-ID: 22588
Marinov, D., et al. “Adsorption and Reactivity of Nitrogen Atoms on Silica Surface under Plasma Exposure.” Journal of Physics D: Applied Physics, 475204, 2014, doi:10.1088/0022-3727/47/47/475204.
LibreCat
| DOI
2014 | Journal Article | LibreCat-ID: 22590
Xu, Ke, et al. “Nanostructured Er<SUB>2</SUB>O<SUB>3</SUB> Thin Films Grown by Metalorganic Chemical Vapour Deposition.” Journal of Nanoscience and Nanotechnology, 2014, pp. 5095–102, doi:10.1166/jnn.2014.8848.
LibreCat
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2013 | Journal Article | LibreCat-ID: 22584
Dang, Van-Son, et al. “Electrical and Optical Properties of TiO2thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition.” Physica Status Solidi (a), 2013, pp. 416–24, doi:10.1002/pssa.201330115.
LibreCat
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2013 | Journal Article | LibreCat-ID: 22589
Srinivasan, Nagendra B., et al. “MOCVD of Tungsten Nitride Thin Films: Comparison of Precursor Performance and Film Characteristics.” Physica Status Solidi (a), 2013, pp. 260–66, doi:10.1002/pssa.201330127.
LibreCat
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2013 | Journal Article | LibreCat-ID: 22596
Xu, Ke, et al. “Atomic Layer Deposition of Er2O3 Thin Films from Er Tris-Guanidinate and Water: Process Optimization, Film Analysis and Electrical Properties.” Journal of Materials Chemistry C, 3939, 2013, doi:10.1039/c3tc30401a.
LibreCat
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2013 | Journal Article | LibreCat-ID: 22593
Srinivasan, N. B., et al. “Transition Metal Nitride Thin Films Grown by MOCVD Using Amidinato Based Complexes [M(NtBu)2{(IPrN)2CMe}2] (M=Mo, W) as Precursors.” Surface and Coatings Technology, 2013, pp. 130–36, doi:10.1016/j.surfcoat.2013.06.024.
LibreCat
| DOI
2013 | Journal Article | LibreCat-ID: 22594
Will, Andreas, et al. “Target Implantation and Redeposition Processes during High-Power Impulse Magnetron Sputtering of Aluminum.” Journal of Physics D: Applied Physics, 084009, 2013, doi:10.1088/0022-3727/46/8/084009.
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