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223 Publications
2013 | Journal Article | LibreCat-ID: 22589
Srinivasan, Nagendra B., et al. “MOCVD of Tungsten Nitride Thin Films: Comparison of Precursor Performance and Film Characteristics.” Physica Status Solidi (a), 2013, pp. 260–66, doi:10.1002/pssa.201330127.
LibreCat
| DOI
2013 | Journal Article | LibreCat-ID: 22596
Xu, Ke, et al. “Atomic Layer Deposition of Er2O3 Thin Films from Er Tris-Guanidinate and Water: Process Optimization, Film Analysis and Electrical Properties.” Journal of Materials Chemistry C, 3939, 2013, doi:10.1039/c3tc30401a.
LibreCat
| DOI
2013 | Journal Article | LibreCat-ID: 22593
Srinivasan, N. B., et al. “Transition Metal Nitride Thin Films Grown by MOCVD Using Amidinato Based Complexes [M(NtBu)2{(IPrN)2CMe}2] (M=Mo, W) as Precursors.” Surface and Coatings Technology, 2013, pp. 130–36, doi:10.1016/j.surfcoat.2013.06.024.
LibreCat
| DOI
2013 | Journal Article | LibreCat-ID: 22594
Will, Andreas, et al. “Target Implantation and Redeposition Processes during High-Power Impulse Magnetron Sputtering of Aluminum.” Journal of Physics D: Applied Physics, 084009, 2013, doi:10.1088/0022-3727/46/8/084009.
LibreCat
| DOI
2013 | Journal Article | LibreCat-ID: 22591
Corbella, Carles, et al. “Particle Beam Experiments for the Analysis of Reactive Sputtering Processes in Metals and Polymer Surfaces.” Review of Scientific Instruments, 103303, 2013, doi:10.1063/1.4826066.
LibreCat
| DOI
2013 | Journal Article | LibreCat-ID: 22595
Winter, J., et al. “Instabilities in High-Power Impulse Magnetron Plasmas: From Stochasticity to Periodicity.” Journal of Physics D: Applied Physics, 084007, 2013, doi:10.1088/0022-3727/46/8/084007.
LibreCat
| DOI
2013 | Journal Article | LibreCat-ID: 22592
Rügner, Katja, et al. “Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure.” Plasma Processes and Polymers, 2013, pp. 1061–73, doi:10.1002/ppap.201300059.
LibreCat
| DOI
2012 | Journal Article | LibreCat-ID: 13548
Thissen, Peter, et al. “PH-Dependent Structure and Energetics of H2O/MgO(100).” Surface Science, vol. 606, 2012, pp. 902–07, doi:10.1016/j.susc.2012.01.018.
LibreCat
| DOI
2012 | Journal Article | LibreCat-ID: 22597
Banerjee, Manish, et al. “Fabrication of ZrO2 and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors.” Crystal Growth & Design, 2012, pp. 5079–89, doi:10.1021/cg3010147.
LibreCat
| DOI
2012 | Journal Article | LibreCat-ID: 22602
Milanov, Andrian P., et al. “Sc2O3, Er2O3, and Y2O3 Thin Films by MOCVD from Volatile Guanidinate Class of Rare-Earth Precursors.” Dalton Transactions, 13936, 2012, doi:10.1039/c2dt31219k.
LibreCat
| DOI
2012 | Journal Article | LibreCat-ID: 22604
Reuter, Rüdiger, et al. “The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide like Films from HMDSO at Atmospheric Pressure.” Plasma Processes and Polymers, 2012, pp. 1116–24, doi:10.1002/ppap.201100146.
LibreCat
| DOI
2012 | Journal Article | LibreCat-ID: 22599
Ehiasarian, A. P., et al. “High Power Impulse Magnetron Sputtering Discharges: Instabilities and Plasma Self-Organization.” Applied Physics Letters, 114101, 2012, doi:10.1063/1.3692172.
LibreCat
| DOI
2012 | Journal Article | LibreCat-ID: 22601
Marot, L., et al. “Nanocomposites of Carbon Nanotubes Embedded in a (Ti,Al)N Coated Film.” Surface and Coatings Technology, 2012, pp. 223–28, doi:10.1016/j.surfcoat.2012.09.053.
LibreCat
| DOI
2012 | Journal Article | LibreCat-ID: 22603
Prenzel, Marina, et al. “Embedded Argon as a Tool for Sampling Local Structure in Thin Plasma Deposited Aluminum Oxide Films.” Journal of Applied Physics, 103306, 2012, doi:10.1063/1.4767383.
LibreCat
| DOI
2012 | Journal Article | LibreCat-ID: 22600
Hecimovic, A., et al. “Temporal Evolution of the Radial Plasma Emissivity Profile in HIPIMS Plasma Discharges.” Plasma Sources Science and Technology, 035017, 2012, doi:10.1088/0963-0252/21/3/035017.
LibreCat
| DOI
2012 | Journal Article | LibreCat-ID: 22605
Schröder, D., et al. “Influence of Target Surfaces on the Atomic Oxygen Distribution in the Effluent of a Micro-Scaled Atmospheric Pressure Plasma Jet.” Plasma Sources Science and Technology, 024007, 2012, doi:10.1088/0963-0252/21/2/024007.
LibreCat
| DOI
2011 | Journal Article | LibreCat-ID: 20947
Maxisch, M., et al. “PM-IRRAS Studies of the Adsorption and Stability of Organophosphonate Monolayers on Passivated NiTi Surfaces.” APPLIED SURFACE SCIENCE, vol. 257, no. 6, 2011, pp. 2011–18, doi:10.1016/j.apsusc.2010.09.044.
LibreCat
| DOI
| WoS
2011 | Journal Article | LibreCat-ID: 22609
Zacher, Denise, et al. “Liquid-Phase Epitaxy of Multicomponent Layer-Based Porous Coordination Polymer Thin Films of [M(L)(P)0.5] Type: Importance of Deposition Sequence on the Oriented Growth.” Chemistry - A European Journal, 2011, pp. 1448–55, doi:10.1002/chem.201002381.
LibreCat
| DOI
2011 | Journal Article | LibreCat-ID: 22598
de los Arcos de Pedro, Maria Teresa, et al. “Influence of Process Parameters on the Crystallinity, Morphology and Composition of Tungsten Oxide-Based Thin Films Grown by Metalorganic Chemical Vapor Deposition.” Thin Solid Films, 2011, pp. 11–16, doi:10.1016/j.tsf.2011.12.007.
LibreCat
| DOI
2011 | Journal Article | LibreCat-ID: 22608
Thiede, Tobias B., et al. “Evaluation of Homoleptic Guanidinate and Amidinate Complexes of Gadolinium and Dysprosium for MOCVD of Rare-Earth Nitride Thin Films.” Chemistry of Materials, 2011, pp. 1430–40, doi:10.1021/cm102840v.
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| DOI