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223 Publications
2013 | Journal Article | LibreCat-ID: 22589
Srinivasan NB, Thiede TB, de los Arcos de Pedro MT, et al. MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics. physica status solidi (a). Published online 2013:260-266. doi:10.1002/pssa.201330127
LibreCat
| DOI
2013 | Journal Article | LibreCat-ID: 22596
Xu K, Chaudhuri AR, Parala H, et al. Atomic layer deposition of Er2O3 thin films from Er tris-guanidinate and water: process optimization, film analysis and electrical properties. Journal of Materials Chemistry C. Published online 2013. doi:10.1039/c3tc30401a
LibreCat
| DOI
2013 | Journal Article | LibreCat-ID: 22593
Srinivasan NB, Thiede TB, de los Arcos de Pedro MT, et al. Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors. Surface and Coatings Technology. Published online 2013:130-136. doi:10.1016/j.surfcoat.2013.06.024
LibreCat
| DOI
2013 | Journal Article | LibreCat-ID: 22594
Will A, de los Arcos de Pedro MT, Corbella C, et al. Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum. Journal of Physics D: Applied Physics. Published online 2013. doi:10.1088/0022-3727/46/8/084009
LibreCat
| DOI
2013 | Journal Article | LibreCat-ID: 22591
Corbella C, Grosse-Kreul S, Kreiter O, de los Arcos de Pedro MT, Benedikt J, von Keudell A. Particle beam experiments for the analysis of reactive sputtering processes in metals and polymer surfaces. Review of Scientific Instruments. Published online 2013. doi:10.1063/1.4826066
LibreCat
| DOI
2013 | Journal Article | LibreCat-ID: 22595
Winter J, Hecimovic A, de los Arcos de Pedro MT, Böke M, Schulz-von der Gathen V. Instabilities in high-power impulse magnetron plasmas: from stochasticity to periodicity. Journal of Physics D: Applied Physics. Published online 2013. doi:10.1088/0022-3727/46/8/084007
LibreCat
| DOI
2013 | Journal Article | LibreCat-ID: 22592
Rügner K, Reuter R, Ellerweg D, de los Arcos de Pedro MT, von Keudell A, Benedikt J. Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure. Plasma Processes and Polymers. Published online 2013:1061-1073. doi:10.1002/ppap.201300059
LibreCat
| DOI
2012 | Journal Article | LibreCat-ID: 13548
Thissen P, Thissen V, Wippermann S, Chabal YJ, Grundmeier G, Schmidt WG. pH-dependent structure and energetics of H2O/MgO(100). Surface Science. 2012;606:902-907. doi:10.1016/j.susc.2012.01.018
LibreCat
| DOI
2012 | Journal Article | LibreCat-ID: 22597
Banerjee M, Srinivasan NB, Zhu H, et al. Fabrication of ZrO2 and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors. Crystal Growth & Design. Published online 2012:5079-5089. doi:10.1021/cg3010147
LibreCat
| DOI
2012 | Journal Article | LibreCat-ID: 22602
Milanov AP, Xu K, Cwik S, et al. Sc2O3, Er2O3, and Y2O3 thin films by MOCVD from volatile guanidinate class of rare-earth precursors. Dalton Transactions. Published online 2012. doi:10.1039/c2dt31219k
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