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223 Publications
2013 | Journal Article | LibreCat-ID: 22589
N. B. Srinivasan et al., “MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics,” physica status solidi (a), pp. 260–266, 2013, doi: 10.1002/pssa.201330127.
LibreCat
| DOI
2013 | Journal Article | LibreCat-ID: 22596
K. Xu et al., “Atomic layer deposition of Er2O3 thin films from Er tris-guanidinate and water: process optimization, film analysis and electrical properties,” Journal of Materials Chemistry C, Art. no. 3939, 2013, doi: 10.1039/c3tc30401a.
LibreCat
| DOI
2013 | Journal Article | LibreCat-ID: 22593
N. B. Srinivasan et al., “Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors,” Surface and Coatings Technology, pp. 130–136, 2013, doi: 10.1016/j.surfcoat.2013.06.024.
LibreCat
| DOI
2013 | Journal Article | LibreCat-ID: 22594
A. Will et al., “Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum,” Journal of Physics D: Applied Physics, Art. no. 084009, 2013, doi: 10.1088/0022-3727/46/8/084009.
LibreCat
| DOI
2013 | Journal Article | LibreCat-ID: 22591
C. Corbella, S. Grosse-Kreul, O. Kreiter, M. T. de los Arcos de Pedro, J. Benedikt, and A. von Keudell, “Particle beam experiments for the analysis of reactive sputtering processes in metals and polymer surfaces,” Review of Scientific Instruments, Art. no. 103303, 2013, doi: 10.1063/1.4826066.
LibreCat
| DOI
2013 | Journal Article | LibreCat-ID: 22595
J. Winter, A. Hecimovic, M. T. de los Arcos de Pedro, M. Böke, and V. Schulz-von der Gathen, “Instabilities in high-power impulse magnetron plasmas: from stochasticity to periodicity,” Journal of Physics D: Applied Physics, Art. no. 084007, 2013, doi: 10.1088/0022-3727/46/8/084007.
LibreCat
| DOI
2013 | Journal Article | LibreCat-ID: 22592
K. Rügner, R. Reuter, D. Ellerweg, M. T. de los Arcos de Pedro, A. von Keudell, and J. Benedikt, “Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure,” Plasma Processes and Polymers, pp. 1061–1073, 2013, doi: 10.1002/ppap.201300059.
LibreCat
| DOI
2012 | Journal Article | LibreCat-ID: 22597
M. Banerjee et al., “Fabrication of ZrO2 and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors,” Crystal Growth & Design, pp. 5079–5089, 2012, doi: 10.1021/cg3010147.
LibreCat
| DOI
2012 | Journal Article | LibreCat-ID: 22602
A. P. Milanov et al., “Sc2O3, Er2O3, and Y2O3 thin films by MOCVD from volatile guanidinate class of rare-earth precursors,” Dalton Transactions, Art. no. 13936, 2012, doi: 10.1039/c2dt31219k.
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| DOI