Please note that LibreCat no longer supports Internet Explorer versions 8 or 9 (or earlier).
We recommend upgrading to the latest Internet Explorer, Google Chrome, or Firefox.
124 Publications
2002 | Journal Article | LibreCat-ID: 39912
Schönstein, I., Müller, J., Hilleringmann, U., & Goser, K. (2002). Characterization of submicron NMOS devices due to visible light emission. Microelectronic Engineering, 21(1–4), 363–366. https://doi.org/10.1016/0167-9317(93)90092-j
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39914
Hilleringmann, U., & Goser, K. (2002). Results of monolithic integration of optical waveguides, photodiodes and CMOS circuits on silicon. Microelectronic Engineering, 19(1–4), 211–214. https://doi.org/10.1016/0167-9317(92)90425-q
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39899
Horstmann, J. T., Hilleringmann, U., & Goser, K. (2002). Characterisation of sub-100 nm-MOS-transistors processed by optical lithography and a sidewall-etchback technique. Microelectronic Engineering, 30(1–4), 431–434. https://doi.org/10.1016/0167-9317(95)00280-4
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39882
Mankowski, V., Hilleringmann, U., & Schumacher, K. (2002). A novel insulation technique for smart power switching devices and very high voltage ICs above 10 kV. Microelectronic Engineering, 53(1–4), 525–528. https://doi.org/10.1016/s0167-9317(00)00370-1
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39879
Horstmann, J. T., Hilleringmann, U., & Goser, K. (2002). 1/f-Noise of sub-100 nm-MOS-transistors fabricated by a special deposition and etchback technique. Microelectronic Engineering, 53(1–4), 213–216. https://doi.org/10.1016/s0167-9317(00)00299-9
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39919
Hilleringmann, U., Knospe, K., Heite, C., Schumacher, K., & Goser, K. (2002). A silicon based technology for monolithic integration of waveguides and VLSI CMOS circuits. Microelectronic Engineering, 15(1–4), 289–292. https://doi.org/10.1016/0167-9317(91)90231-2
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39920
Soennecken, A., Hilleringmann, U., & Goser, K. (2002). Floating gate structures as nonvolatile analog memory cells in 1.0μm-LOCOS-CMOS technology with PZT dielectrica. Microelectronic Engineering, 15(1–4), 633–636. https://doi.org/10.1016/0167-9317(91)90299-s
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39915
Hilleringmann, U., & Goser, K. (2002). Results of monolithic integration of optical waveguides, photodiodes and CMOS circuits on silicon. Microelectronic Engineering, 19(1–4), 211–214. https://doi.org/10.1016/0167-9317(92)90425-q
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39916
Adams, S., Hilleringmann, U., & Goser, K. (2002). CMOS compatible micromachining by dry silicon-etching techniques. Microelectronic Engineering, 19(1–4), 191–194. https://doi.org/10.1016/0167-9317(92)90420-v
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39348
Horstmann, J. T., Hilleringmann, U., & Goser, K. F. (2002). Matching analysis of deposition defined 50-nm MOSFET’s. IEEE Transactions on Electron Devices, 45(1), 299–306. https://doi.org/10.1109/16.658845
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39889
Mankowski, V., Hilleringmann, U., & Schumacher, K. (2002). 12 kV low current cascaded light triggered switch on one silicon chip. Microelectronic Engineering, 46(1–4), 413–417. https://doi.org/10.1016/s0167-9317(99)00122-7
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39891
Horstmann, J. T., Hilleringmann, U., & Goser, K. F. (2002). Matching analysis of deposition defined 50-nm MOSFET’s. IEEE Transactions on Electron Devices, 45(1), 299–306. https://doi.org/10.1109/16.658845
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39886
Wirth, G., Hilleringmann, U., Horstmann, J. T., & Goser, K. (2002). Mesoscopic transport phenomena in ultrashort channel MOSFETs. Solid-State Electronics, 43(7), 1245–1250. https://doi.org/10.1016/s0038-1101(99)00060-x
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39876
Otterbach, R., Hilleringmann, U., Horstmann, T. J., & Goser, K. (2002). Structures with a minimum feature size of less than 100 nm in CVD-diamond for sensor applications. Diamond and Related Materials, 10(3–7), 511–514. https://doi.org/10.1016/s0925-9635(01)00373-9
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39877
Hilleringmann, U., Vieregge, T., & Horstmann, J. T. (2002). A structure definition technique for 25 nm lines of silicon and related materials. Microelectronic Engineering, 53(1–4), 569–572. https://doi.org/10.1016/s0167-9317(00)00380-4
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39874
Otterbach, R., & Hilleringmann, U. (2002). Reactive ion etching of CVD-diamond for piezoresistive pressure sensors. Diamond and Related Materials, 11(3–6), 841–844. https://doi.org/10.1016/s0925-9635(01)00703-8
LibreCat
| DOI
2000 | Journal Article | LibreCat-ID: 40083
Glossmann, J., Hoischen, A., Roder, T., & Kitzerow, H.-S. (2000). Asymmetric switching and storage effects in ferroelectric and antiferroelectric gels and polymers. Ferroelectrics, 243(1), 95–106. https://doi.org/10.1080/00150190008008011
LibreCat
| DOI
1999 | Journal Article | LibreCat-ID: 40223
Buey, J., Espinet, P., Kitzerow, H.-S., & Strauss, J. (1999). Metallomesogens presenting blue phases in a glassy state and in metallomesogen/nematic mixtures. Chemical Communications, 5, 441–442. https://doi.org/10.1039/a900374f
LibreCat
| DOI
1996 | Journal Article | LibreCat-ID: 40081
Kitzerow, H.-S., Slaney, A. J., & Goodby, J. W. (1996). Electric field-induced transition from the twist grain boundary TGBAphase to the tilted smectic SmC* phase. Ferroelectrics, 179(1), 61–80. https://doi.org/10.1080/00150199608007874
LibreCat
| DOI
1994 | Journal Article | LibreCat-ID: 35384
Kratzat, K., Schmidt, C., & Finkelmann, H. (1994). A Doubly Branched Nonionic Oligooxyethylene V-Amphiphile: Effect of Molecular Geometry on Liquid-Crystalline Phase Behavior, 3. Journal of Colloid and Interface Science, 163(1), 190–198. https://doi.org/10.1006/jcis.1994.1095
LibreCat
| DOI