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308 Publications
2013 | Journal Article | LibreCat-ID: 20946
Alissawi N, Peter T, Strunskus T, Ebbert C, Grundmeier G, Faupel F. Plasma-polymerized HMDSO coatings to adjust the silver ion release properties of Ag/polymer nanocomposites. JOURNAL OF NANOPARTICLE RESEARCH. 2013;15(11). doi:10.1007/s11051-013-2080-9
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| WoS
2013 | Journal Article | LibreCat-ID: 23641
Wang Z, Mohammadzadeh S, Schmaltz T, et al. Region-Selective Self-Assembly of Functionalized Carbon Allotropes from Solution. ACS Nano. 2013;7:11427-11434. doi:10.1021/nn405488n
LibreCat
| DOI
2013 | Journal Article | LibreCat-ID: 23642
Schmaltz T, Amin AY, Khassanov A, et al. Low-Voltage Self-Assembled Monolayer Field-Effect Transistors on Flexible Substrates. Advanced Materials. 2013;25:4511-4514. doi:10.1002/adma.201301176
LibreCat
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2013 | Journal Article | LibreCat-ID: 23643
Will J, Gröschel A, Kot D, et al. Oxygen diffusivity in silicon derived from dynamical X-ray diffraction. Journal of Applied Physics. 2013;7:073508. doi:10.1063/1.4792747
LibreCat
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2013 | Journal Article | LibreCat-ID: 22584
Dang V-S, Parala H, Kim JH, et al. Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition. physica status solidi (a). Published online 2013:416-424. doi:10.1002/pssa.201330115
LibreCat
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2013 | Journal Article | LibreCat-ID: 22589
Srinivasan NB, Thiede TB, de los Arcos de Pedro MT, et al. MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics. physica status solidi (a). Published online 2013:260-266. doi:10.1002/pssa.201330127
LibreCat
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2013 | Journal Article | LibreCat-ID: 22596
Xu K, Chaudhuri AR, Parala H, et al. Atomic layer deposition of Er2O3 thin films from Er tris-guanidinate and water: process optimization, film analysis and electrical properties. Journal of Materials Chemistry C. Published online 2013. doi:10.1039/c3tc30401a
LibreCat
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2013 | Journal Article | LibreCat-ID: 22593
Srinivasan NB, Thiede TB, de los Arcos de Pedro MT, et al. Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors. Surface and Coatings Technology. Published online 2013:130-136. doi:10.1016/j.surfcoat.2013.06.024
LibreCat
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2013 | Journal Article | LibreCat-ID: 22594
Will A, de los Arcos de Pedro MT, Corbella C, et al. Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum. Journal of Physics D: Applied Physics. Published online 2013. doi:10.1088/0022-3727/46/8/084009
LibreCat
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2013 | Journal Article | LibreCat-ID: 22591
Corbella C, Grosse-Kreul S, Kreiter O, de los Arcos de Pedro MT, Benedikt J, von Keudell A. Particle beam experiments for the analysis of reactive sputtering processes in metals and polymer surfaces. Review of Scientific Instruments. Published online 2013. doi:10.1063/1.4826066
LibreCat
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2013 | Journal Article | LibreCat-ID: 22595
Winter J, Hecimovic A, de los Arcos de Pedro MT, Böke M, Schulz-von der Gathen V. Instabilities in high-power impulse magnetron plasmas: from stochasticity to periodicity. Journal of Physics D: Applied Physics. Published online 2013. doi:10.1088/0022-3727/46/8/084007
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2013 | Journal Article | LibreCat-ID: 22592
Rügner K, Reuter R, Ellerweg D, de los Arcos de Pedro MT, von Keudell A, Benedikt J. Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure. Plasma Processes and Polymers. Published online 2013:1061-1073. doi:10.1002/ppap.201300059
LibreCat
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2012 | Journal Article | LibreCat-ID: 13548
Thissen P, Thissen V, Wippermann S, Chabal YJ, Grundmeier G, Schmidt WG. pH-dependent structure and energetics of H2O/MgO(100). Surface Science. 2012;606:902-907. doi:10.1016/j.susc.2012.01.018
LibreCat
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2012 | Journal Article | LibreCat-ID: 22597
Banerjee M, Srinivasan NB, Zhu H, et al. Fabrication of ZrO2 and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors. Crystal Growth & Design. Published online 2012:5079-5089. doi:10.1021/cg3010147
LibreCat
| DOI
2012 | Journal Article | LibreCat-ID: 22602
Milanov AP, Xu K, Cwik S, et al. Sc2O3, Er2O3, and Y2O3 thin films by MOCVD from volatile guanidinate class of rare-earth precursors. Dalton Transactions. Published online 2012. doi:10.1039/c2dt31219k
LibreCat
| DOI
2012 | Journal Article | LibreCat-ID: 22604
Reuter R, Rügner K, Ellerweg D, de los Arcos de Pedro MT, von Keudell A, Benedikt J. The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide like Films from HMDSO at Atmospheric Pressure. Plasma Processes and Polymers. Published online 2012:1116-1124. doi:10.1002/ppap.201100146
LibreCat
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2012 | Journal Article | LibreCat-ID: 22599
Ehiasarian AP, Hecimovic A, de los Arcos de Pedro MT, et al. High power impulse magnetron sputtering discharges: Instabilities and plasma self-organization. Applied Physics Letters. Published online 2012. doi:10.1063/1.3692172
LibreCat
| DOI
2012 | Journal Article | LibreCat-ID: 22601
Marot L, de los Arcos de Pedro MT, Bünzli AM, et al. Nanocomposites of carbon nanotubes embedded in a (Ti,Al)N coated film. Surface and Coatings Technology. Published online 2012:223-228. doi:10.1016/j.surfcoat.2012.09.053
LibreCat
| DOI
2012 | Journal Article | LibreCat-ID: 22603
Prenzel M, de los Arcos de Pedro MT, Kortmann A, Winter J, von Keudell A. Embedded argon as a tool for sampling local structure in thin plasma deposited aluminum oxide films. Journal of Applied Physics. Published online 2012. doi:10.1063/1.4767383
LibreCat
| DOI
2012 | Journal Article | LibreCat-ID: 22600
Hecimovic A, de los Arcos de Pedro MT, Schulz-von der Gathen V, Böke M, Winter J. Temporal evolution of the radial plasma emissivity profile in HIPIMS plasma discharges. Plasma Sources Science and Technology. Published online 2012. doi:10.1088/0963-0252/21/3/035017
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