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18 Publications


2017 | Journal Article | LibreCat-ID: 7026
V. Zolatanosha and D. Reuter, “Robust Si 3 N 4 masks for 100 nm selective area epitaxy of GaAs-based nanostructures,” Microelectronic Engineering, vol. 180, pp. 35–39, 2017.
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2016 | Journal Article | LibreCat-ID: 3956
T. Meyers, F. F. Vidor, K. Brassat, J. Lindner, and U. Hilleringmann, “Low-voltage DNTT-based thin-film transistors and inverters for flexible electronics,” Microelectronic Engineering, vol. 174, pp. 35–39, 2016.
LibreCat | Files available | DOI
 

2016 | Journal Article | LibreCat-ID: 39447
T. Meyers, F. F. Vidor, K. Brassat, J. K. N. Lindner, and U. Hilleringmann, “Low-voltage DNTT-based thin-film transistors and inverters for flexible electronics,” Microelectronic Engineering, vol. 174, pp. 35–39, 2016, doi: 10.1016/j.mee.2016.12.018.
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2016 | Journal Article | LibreCat-ID: 39466
F. F. Vidor, T. Meyers, G. I. Wirth, and U. Hilleringmann, “ZnO nanoparticle thin-film transistors on flexible substrate using spray-coating technique,” Microelectronic Engineering, vol. 159, pp. 155–158, 2016, doi: 10.1016/j.mee.2016.02.059.
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2003 | Journal Article | LibreCat-ID: 8728
S. Zankovych et al., “Nanoimprint-induced effects on electrical and optical properties of quantum well structures,” Microelectronic Engineering, pp. 214–220, 2003.
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2003 | Journal Article | LibreCat-ID: 39851
Ch. Pannemann, T. Diekmann, and U. Hilleringmann, “Nanometer scale organic thin film transistors with Pentacene,” Microelectronic Engineering, vol. 67–68, pp. 845–852, 2003, doi: 10.1016/s0167-9317(03)00146-1.
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2002 | Journal Article | LibreCat-ID: 8733
D. Kähler, U. Kunze, D. Reuter, and A. D. Wieck, “Quantum wire fabrication from compensating-layer GaAs–AlGaAs heterostructures,” Microelectronic Engineering, pp. 619–623, 2002.
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2002 | Journal Article | LibreCat-ID: 39912
I. Schönstein, J. Müller, U. Hilleringmann, and K. Goser, “Characterization of submicron NMOS devices due to visible light emission,” Microelectronic Engineering, vol. 21, no. 1–4, pp. 363–366, 2002, doi: 10.1016/0167-9317(93)90092-j.
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2002 | Journal Article | LibreCat-ID: 39914
U. Hilleringmann and K. Goser, “Results of monolithic integration of optical waveguides, photodiodes and CMOS circuits on silicon,” Microelectronic Engineering, vol. 19, no. 1–4, pp. 211–214, 2002, doi: 10.1016/0167-9317(92)90425-q.
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2002 | Journal Article | LibreCat-ID: 39899
J. T. Horstmann, U. Hilleringmann, and K. Goser, “Characterisation of sub-100 nm-MOS-transistors processed by optical lithography and a sidewall-etchback technique,” Microelectronic Engineering, vol. 30, no. 1–4, pp. 431–434, 2002, doi: 10.1016/0167-9317(95)00280-4.
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2002 | Journal Article | LibreCat-ID: 39882
V. Mankowski, U. Hilleringmann, and K. Schumacher, “A novel insulation technique for smart power switching devices and very high voltage ICs above 10 kV,” Microelectronic Engineering, vol. 53, no. 1–4, pp. 525–528, 2002, doi: 10.1016/s0167-9317(00)00370-1.
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2002 | Journal Article | LibreCat-ID: 39879
J. T. Horstmann, U. Hilleringmann, and K. Goser, “1/f-Noise of sub-100 nm-MOS-transistors fabricated by a special deposition and etchback technique,” Microelectronic Engineering, vol. 53, no. 1–4, pp. 213–216, 2002, doi: 10.1016/s0167-9317(00)00299-9.
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2002 | Journal Article | LibreCat-ID: 39919
U. Hilleringmann, K. Knospe, C. Heite, K. Schumacher, and K. Goser, “A silicon based technology for monolithic integration of waveguides and VLSI CMOS circuits,” Microelectronic Engineering, vol. 15, no. 1–4, pp. 289–292, 2002, doi: 10.1016/0167-9317(91)90231-2.
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2002 | Journal Article | LibreCat-ID: 39920
A. Soennecken, U. Hilleringmann, and K. Goser, “Floating gate structures as nonvolatile analog memory cells in 1.0μm-LOCOS-CMOS technology with PZT dielectrica,” Microelectronic Engineering, vol. 15, no. 1–4, pp. 633–636, 2002, doi: 10.1016/0167-9317(91)90299-s.
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2002 | Journal Article | LibreCat-ID: 39915
U. Hilleringmann and K. Goser, “Results of monolithic integration of optical waveguides, photodiodes and CMOS circuits on silicon,” Microelectronic Engineering, vol. 19, no. 1–4, pp. 211–214, 2002, doi: 10.1016/0167-9317(92)90425-q.
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2002 | Journal Article | LibreCat-ID: 39916
S. Adams, U. Hilleringmann, and K. Goser, “CMOS compatible micromachining by dry silicon-etching techniques,” Microelectronic Engineering, vol. 19, no. 1–4, pp. 191–194, 2002, doi: 10.1016/0167-9317(92)90420-v.
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2002 | Journal Article | LibreCat-ID: 39889
V. Mankowski, U. Hilleringmann, and K. Schumacher, “12 kV low current cascaded light triggered switch on one silicon chip,” Microelectronic Engineering, vol. 46, no. 1–4, pp. 413–417, 2002, doi: 10.1016/s0167-9317(99)00122-7.
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2002 | Journal Article | LibreCat-ID: 39877
U. Hilleringmann, T. Vieregge, and J. T. Horstmann, “A structure definition technique for 25 nm lines of silicon and related materials,” Microelectronic Engineering, vol. 53, no. 1–4, pp. 569–572, 2002, doi: 10.1016/s0167-9317(00)00380-4.
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