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18 Publications
2017 | Journal Article | LibreCat-ID: 7026
Zolatanosha, Viktoryia, and Dirk Reuter. “Robust Si 3 N 4 Masks for 100 Nm Selective Area Epitaxy of GaAs-Based Nanostructures.” Microelectronic Engineering 180 (2017): 35–39. https://doi.org/10.1016/j.mee.2017.05.053.
LibreCat
| DOI
2016 | Journal Article | LibreCat-ID: 3956
Meyers, Thorsten, Fábio F. Vidor, Katharina Brassat, Jörg Lindner, and Ulrich Hilleringmann. “Low-Voltage DNTT-Based Thin-Film Transistors and Inverters for Flexible Electronics.” Microelectronic Engineering 174 (2016): 35–39. https://doi.org/10.1016/j.mee.2016.12.018.
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| DOI
2016 | Journal Article | LibreCat-ID: 39447
Meyers, Thorsten, Fábio F. Vidor, Katharina Brassat, Jörg K.N. Lindner, and Ulrich Hilleringmann. “Low-Voltage DNTT-Based Thin-Film Transistors and Inverters for Flexible Electronics.” Microelectronic Engineering 174 (2016): 35–39. https://doi.org/10.1016/j.mee.2016.12.018.
LibreCat
| DOI
2016 | Journal Article | LibreCat-ID: 39466
Vidor, Fábio F., Thorsten Meyers, Gilson I. Wirth, and Ulrich Hilleringmann. “ZnO Nanoparticle Thin-Film Transistors on Flexible Substrate Using Spray-Coating Technique.” Microelectronic Engineering 159 (2016): 155–58. https://doi.org/10.1016/j.mee.2016.02.059.
LibreCat
| DOI
2003 | Journal Article | LibreCat-ID: 8728
Zankovych, S., I. Maximov, I. Shorubalko, J. Seekamp, M. Beck, S. Romanov, Dirk Reuter, et al. “Nanoimprint-Induced Effects on Electrical and Optical Properties of Quantum Well Structures.” Microelectronic Engineering, 2003, 214–20. https://doi.org/10.1016/s0167-9317(03)00074-1.
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| DOI
2003 | Journal Article | LibreCat-ID: 39851
Pannemann, Ch., T. Diekmann, and Ulrich Hilleringmann. “Nanometer Scale Organic Thin Film Transistors with Pentacene.” Microelectronic Engineering 67–68 (2003): 845–52. https://doi.org/10.1016/s0167-9317(03)00146-1.
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| DOI
2002 | Journal Article | LibreCat-ID: 8733
Kähler, D., U. Kunze, Dirk Reuter, and A.D. Wieck. “Quantum Wire Fabrication from Compensating-Layer GaAs–AlGaAs Heterostructures.” Microelectronic Engineering, 2002, 619–23. https://doi.org/10.1016/s0167-9317(02)00474-4.
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| DOI
2002 | Journal Article | LibreCat-ID: 39912
Schönstein, I., J. Müller, Ulrich Hilleringmann, and K. Goser. “Characterization of Submicron NMOS Devices Due to Visible Light Emission.” Microelectronic Engineering 21, no. 1–4 (2002): 363–66. https://doi.org/10.1016/0167-9317(93)90092-j.
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39914
Hilleringmann, Ulrich, and K. Goser. “Results of Monolithic Integration of Optical Waveguides, Photodiodes and CMOS Circuits on Silicon.” Microelectronic Engineering 19, no. 1–4 (2002): 211–14. https://doi.org/10.1016/0167-9317(92)90425-q.
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| DOI
2002 | Journal Article | LibreCat-ID: 39899
Horstmann, J.T., Ulrich Hilleringmann, and K. Goser. “Characterisation of Sub-100 Nm-MOS-Transistors Processed by Optical Lithography and a Sidewall-Etchback Technique.” Microelectronic Engineering 30, no. 1–4 (2002): 431–34. https://doi.org/10.1016/0167-9317(95)00280-4.
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| DOI
2002 | Journal Article | LibreCat-ID: 39882
Mankowski, V., Ulrich Hilleringmann, and K. Schumacher. “A Novel Insulation Technique for Smart Power Switching Devices and Very High Voltage ICs above 10 KV.” Microelectronic Engineering 53, no. 1–4 (2002): 525–28. https://doi.org/10.1016/s0167-9317(00)00370-1.
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39879
Horstmann, J.T., Ulrich Hilleringmann, and K. Goser. “1/f-Noise of Sub-100 Nm-MOS-Transistors Fabricated by a Special Deposition and Etchback Technique.” Microelectronic Engineering 53, no. 1–4 (2002): 213–16. https://doi.org/10.1016/s0167-9317(00)00299-9.
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39919
Hilleringmann, Ulrich, K. Knospe, C. Heite, K. Schumacher, and K. Goser. “A Silicon Based Technology for Monolithic Integration of Waveguides and VLSI CMOS Circuits.” Microelectronic Engineering 15, no. 1–4 (2002): 289–92. https://doi.org/10.1016/0167-9317(91)90231-2.
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| DOI
2002 | Journal Article | LibreCat-ID: 39920
Soennecken, A., Ulrich Hilleringmann, and K. Goser. “Floating Gate Structures as Nonvolatile Analog Memory Cells in 1.0μm-LOCOS-CMOS Technology with PZT Dielectrica.” Microelectronic Engineering 15, no. 1–4 (2002): 633–36. https://doi.org/10.1016/0167-9317(91)90299-s.
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| DOI
2002 | Journal Article | LibreCat-ID: 39915
Hilleringmann, Ulrich, and K. Goser. “Results of Monolithic Integration of Optical Waveguides, Photodiodes and CMOS Circuits on Silicon.” Microelectronic Engineering 19, no. 1–4 (2002): 211–14. https://doi.org/10.1016/0167-9317(92)90425-q.
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| DOI
2002 | Journal Article | LibreCat-ID: 39916
Adams, S., Ulrich Hilleringmann, and K. Goser. “CMOS Compatible Micromachining by Dry Silicon-Etching Techniques.” Microelectronic Engineering 19, no. 1–4 (2002): 191–94. https://doi.org/10.1016/0167-9317(92)90420-v.
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2002 | Journal Article | LibreCat-ID: 39889
Mankowski, V., Ulrich Hilleringmann, and K. Schumacher. “12 KV Low Current Cascaded Light Triggered Switch on One Silicon Chip.” Microelectronic Engineering 46, no. 1–4 (2002): 413–17. https://doi.org/10.1016/s0167-9317(99)00122-7.
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| DOI
2002 | Journal Article | LibreCat-ID: 39877
Hilleringmann, Ulrich, T. Vieregge, and J.T. Horstmann. “A Structure Definition Technique for 25 Nm Lines of Silicon and Related Materials.” Microelectronic Engineering 53, no. 1–4 (2002): 569–72. https://doi.org/10.1016/s0167-9317(00)00380-4.
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