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18 Publications
2017 | Journal Article | LibreCat-ID: 7026
Zolatanosha, V., & Reuter, D. (2017). Robust Si 3 N 4 masks for 100 nm selective area epitaxy of GaAs-based nanostructures. Microelectronic Engineering, 180, 35–39. https://doi.org/10.1016/j.mee.2017.05.053
LibreCat
| DOI
2016 | Journal Article | LibreCat-ID: 3956
Meyers, T., Vidor, F. F., Brassat, K., Lindner, J., & Hilleringmann, U. (2016). Low-voltage DNTT-based thin-film transistors and inverters for flexible electronics. Microelectronic Engineering, 174, 35–39. https://doi.org/10.1016/j.mee.2016.12.018
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| DOI
2016 | Journal Article | LibreCat-ID: 39447
Meyers, T., Vidor, F. F., Brassat, K., Lindner, J. K. N., & Hilleringmann, U. (2016). Low-voltage DNTT-based thin-film transistors and inverters for flexible electronics. Microelectronic Engineering, 174, 35–39. https://doi.org/10.1016/j.mee.2016.12.018
LibreCat
| DOI
2016 | Journal Article | LibreCat-ID: 39466
Vidor, F. F., Meyers, T., Wirth, G. I., & Hilleringmann, U. (2016). ZnO nanoparticle thin-film transistors on flexible substrate using spray-coating technique. Microelectronic Engineering, 159, 155–158. https://doi.org/10.1016/j.mee.2016.02.059
LibreCat
| DOI
2003 | Journal Article | LibreCat-ID: 8728
Zankovych, S., Maximov, I., Shorubalko, I., Seekamp, J., Beck, M., Romanov, S., … Montelius, L. (2003). Nanoimprint-induced effects on electrical and optical properties of quantum well structures. Microelectronic Engineering, 214–220. https://doi.org/10.1016/s0167-9317(03)00074-1
LibreCat
| DOI
2003 | Journal Article | LibreCat-ID: 39851
Pannemann, Ch., Diekmann, T., & Hilleringmann, U. (2003). Nanometer scale organic thin film transistors with Pentacene. Microelectronic Engineering, 67–68, 845–852. https://doi.org/10.1016/s0167-9317(03)00146-1
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 8733
Kähler, D., Kunze, U., Reuter, D., & Wieck, A. D. (2002). Quantum wire fabrication from compensating-layer GaAs–AlGaAs heterostructures. Microelectronic Engineering, 619–623. https://doi.org/10.1016/s0167-9317(02)00474-4
LibreCat
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2002 | Journal Article | LibreCat-ID: 39912
Schönstein, I., Müller, J., Hilleringmann, U., & Goser, K. (2002). Characterization of submicron NMOS devices due to visible light emission. Microelectronic Engineering, 21(1–4), 363–366. https://doi.org/10.1016/0167-9317(93)90092-j
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39914
Hilleringmann, U., & Goser, K. (2002). Results of monolithic integration of optical waveguides, photodiodes and CMOS circuits on silicon. Microelectronic Engineering, 19(1–4), 211–214. https://doi.org/10.1016/0167-9317(92)90425-q
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2002 | Journal Article | LibreCat-ID: 39899
Horstmann, J. T., Hilleringmann, U., & Goser, K. (2002). Characterisation of sub-100 nm-MOS-transistors processed by optical lithography and a sidewall-etchback technique. Microelectronic Engineering, 30(1–4), 431–434. https://doi.org/10.1016/0167-9317(95)00280-4
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2002 | Journal Article | LibreCat-ID: 39882
Mankowski, V., Hilleringmann, U., & Schumacher, K. (2002). A novel insulation technique for smart power switching devices and very high voltage ICs above 10 kV. Microelectronic Engineering, 53(1–4), 525–528. https://doi.org/10.1016/s0167-9317(00)00370-1
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39879
Horstmann, J. T., Hilleringmann, U., & Goser, K. (2002). 1/f-Noise of sub-100 nm-MOS-transistors fabricated by a special deposition and etchback technique. Microelectronic Engineering, 53(1–4), 213–216. https://doi.org/10.1016/s0167-9317(00)00299-9
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39919
Hilleringmann, U., Knospe, K., Heite, C., Schumacher, K., & Goser, K. (2002). A silicon based technology for monolithic integration of waveguides and VLSI CMOS circuits. Microelectronic Engineering, 15(1–4), 289–292. https://doi.org/10.1016/0167-9317(91)90231-2
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39920
Soennecken, A., Hilleringmann, U., & Goser, K. (2002). Floating gate structures as nonvolatile analog memory cells in 1.0μm-LOCOS-CMOS technology with PZT dielectrica. Microelectronic Engineering, 15(1–4), 633–636. https://doi.org/10.1016/0167-9317(91)90299-s
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39915
Hilleringmann, U., & Goser, K. (2002). Results of monolithic integration of optical waveguides, photodiodes and CMOS circuits on silicon. Microelectronic Engineering, 19(1–4), 211–214. https://doi.org/10.1016/0167-9317(92)90425-q
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2002 | Journal Article | LibreCat-ID: 39916
Adams, S., Hilleringmann, U., & Goser, K. (2002). CMOS compatible micromachining by dry silicon-etching techniques. Microelectronic Engineering, 19(1–4), 191–194. https://doi.org/10.1016/0167-9317(92)90420-v
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2002 | Journal Article | LibreCat-ID: 39889
Mankowski, V., Hilleringmann, U., & Schumacher, K. (2002). 12 kV low current cascaded light triggered switch on one silicon chip. Microelectronic Engineering, 46(1–4), 413–417. https://doi.org/10.1016/s0167-9317(99)00122-7
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39877
Hilleringmann, U., Vieregge, T., & Horstmann, J. T. (2002). A structure definition technique for 25 nm lines of silicon and related materials. Microelectronic Engineering, 53(1–4), 569–572. https://doi.org/10.1016/s0167-9317(00)00380-4
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