Please note that LibreCat no longer supports Internet Explorer versions 8 or 9 (or earlier).
We recommend upgrading to the latest Internet Explorer, Google Chrome, or Firefox.
18 Publications
2017 | Journal Article | LibreCat-ID: 7026
Zolatanosha V, Reuter D. Robust Si 3 N 4 masks for 100 nm selective area epitaxy of GaAs-based nanostructures. Microelectronic Engineering. 2017;180:35-39. doi:10.1016/j.mee.2017.05.053
LibreCat
| DOI
2016 | Journal Article | LibreCat-ID: 3956
Meyers T, Vidor FF, Brassat K, Lindner J, Hilleringmann U. Low-voltage DNTT-based thin-film transistors and inverters for flexible electronics. Microelectronic Engineering. 2016;174:35-39. doi:10.1016/j.mee.2016.12.018
LibreCat
| Files available
| DOI
2016 | Journal Article | LibreCat-ID: 39447
Meyers T, Vidor FF, Brassat K, Lindner JKN, Hilleringmann U. Low-voltage DNTT-based thin-film transistors and inverters for flexible electronics. Microelectronic Engineering. 2016;174:35-39. doi:10.1016/j.mee.2016.12.018
LibreCat
| DOI
2016 | Journal Article | LibreCat-ID: 39466
Vidor FF, Meyers T, Wirth GI, Hilleringmann U. ZnO nanoparticle thin-film transistors on flexible substrate using spray-coating technique. Microelectronic Engineering. 2016;159:155-158. doi:10.1016/j.mee.2016.02.059
LibreCat
| DOI
2003 | Journal Article | LibreCat-ID: 8728
Zankovych S, Maximov I, Shorubalko I, et al. Nanoimprint-induced effects on electrical and optical properties of quantum well structures. Microelectronic Engineering. 2003:214-220. doi:10.1016/s0167-9317(03)00074-1
LibreCat
| DOI
2003 | Journal Article | LibreCat-ID: 39851
Pannemann Ch, Diekmann T, Hilleringmann U. Nanometer scale organic thin film transistors with Pentacene. Microelectronic Engineering. 2003;67-68:845-852. doi:10.1016/s0167-9317(03)00146-1
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 8733
Kähler D, Kunze U, Reuter D, Wieck AD. Quantum wire fabrication from compensating-layer GaAs–AlGaAs heterostructures. Microelectronic Engineering. 2002:619-623. doi:10.1016/s0167-9317(02)00474-4
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39912
Schönstein I, Müller J, Hilleringmann U, Goser K. Characterization of submicron NMOS devices due to visible light emission. Microelectronic Engineering. 2002;21(1-4):363-366. doi:10.1016/0167-9317(93)90092-j
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39914
Hilleringmann U, Goser K. Results of monolithic integration of optical waveguides, photodiodes and CMOS circuits on silicon. Microelectronic Engineering. 2002;19(1-4):211-214. doi:10.1016/0167-9317(92)90425-q
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39899
Horstmann JT, Hilleringmann U, Goser K. Characterisation of sub-100 nm-MOS-transistors processed by optical lithography and a sidewall-etchback technique. Microelectronic Engineering. 2002;30(1-4):431-434. doi:10.1016/0167-9317(95)00280-4
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39882
Mankowski V, Hilleringmann U, Schumacher K. A novel insulation technique for smart power switching devices and very high voltage ICs above 10 kV. Microelectronic Engineering. 2002;53(1-4):525-528. doi:10.1016/s0167-9317(00)00370-1
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39879
Horstmann JT, Hilleringmann U, Goser K. 1/f-Noise of sub-100 nm-MOS-transistors fabricated by a special deposition and etchback technique. Microelectronic Engineering. 2002;53(1-4):213-216. doi:10.1016/s0167-9317(00)00299-9
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39919
Hilleringmann U, Knospe K, Heite C, Schumacher K, Goser K. A silicon based technology for monolithic integration of waveguides and VLSI CMOS circuits. Microelectronic Engineering. 2002;15(1-4):289-292. doi:10.1016/0167-9317(91)90231-2
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39920
Soennecken A, Hilleringmann U, Goser K. Floating gate structures as nonvolatile analog memory cells in 1.0μm-LOCOS-CMOS technology with PZT dielectrica. Microelectronic Engineering. 2002;15(1-4):633-636. doi:10.1016/0167-9317(91)90299-s
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39915
Hilleringmann U, Goser K. Results of monolithic integration of optical waveguides, photodiodes and CMOS circuits on silicon. Microelectronic Engineering. 2002;19(1-4):211-214. doi:10.1016/0167-9317(92)90425-q
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39916
Adams S, Hilleringmann U, Goser K. CMOS compatible micromachining by dry silicon-etching techniques. Microelectronic Engineering. 2002;19(1-4):191-194. doi:10.1016/0167-9317(92)90420-v
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39889
Mankowski V, Hilleringmann U, Schumacher K. 12 kV low current cascaded light triggered switch on one silicon chip. Microelectronic Engineering. 2002;46(1-4):413-417. doi:10.1016/s0167-9317(99)00122-7
LibreCat
| DOI
2002 | Journal Article | LibreCat-ID: 39877
Hilleringmann U, Vieregge T, Horstmann JT. A structure definition technique for 25 nm lines of silicon and related materials. Microelectronic Engineering. 2002;53(1-4):569-572. doi:10.1016/s0167-9317(00)00380-4
LibreCat
| DOI