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18 Publications
2017 | Journal Article | LibreCat-ID: 7026
Robust Si 3 N 4 masks for 100 nm selective area epitaxy of GaAs-based nanostructures
V. Zolatanosha, D. Reuter, Microelectronic Engineering 180 (2017) 35–39.
LibreCat
| DOI
V. Zolatanosha, D. Reuter, Microelectronic Engineering 180 (2017) 35–39.
2016 | Journal Article | LibreCat-ID: 3956
Low-voltage DNTT-based thin-film transistors and inverters for flexible electronics
T. Meyers, F.F. Vidor, K. Brassat, J. Lindner, U. Hilleringmann, Microelectronic Engineering 174 (2016) 35–39.
LibreCat
| Files available
| DOI
T. Meyers, F.F. Vidor, K. Brassat, J. Lindner, U. Hilleringmann, Microelectronic Engineering 174 (2016) 35–39.
2016 | Journal Article | LibreCat-ID: 39447
Low-voltage DNTT-based thin-film transistors and inverters for flexible electronics
T. Meyers, F.F. Vidor, K. Brassat, J.K.N. Lindner, U. Hilleringmann, Microelectronic Engineering 174 (2016) 35–39.
LibreCat
| DOI
T. Meyers, F.F. Vidor, K. Brassat, J.K.N. Lindner, U. Hilleringmann, Microelectronic Engineering 174 (2016) 35–39.
2016 | Journal Article | LibreCat-ID: 39466
ZnO nanoparticle thin-film transistors on flexible substrate using spray-coating technique
F.F. Vidor, T. Meyers, G.I. Wirth, U. Hilleringmann, Microelectronic Engineering 159 (2016) 155–158.
LibreCat
| DOI
F.F. Vidor, T. Meyers, G.I. Wirth, U. Hilleringmann, Microelectronic Engineering 159 (2016) 155–158.
2003 | Journal Article | LibreCat-ID: 8728
Nanoimprint-induced effects on electrical and optical properties of quantum well structures
S. Zankovych, I. Maximov, I. Shorubalko, J. Seekamp, M. Beck, S. Romanov, D. Reuter, P. Schafmeister, A.D. Wieck, J. Ahopelto, C.M. Sotomayor Torres, L. Montelius, Microelectronic Engineering (2003) 214–220.
LibreCat
| DOI
S. Zankovych, I. Maximov, I. Shorubalko, J. Seekamp, M. Beck, S. Romanov, D. Reuter, P. Schafmeister, A.D. Wieck, J. Ahopelto, C.M. Sotomayor Torres, L. Montelius, Microelectronic Engineering (2003) 214–220.
2003 | Journal Article | LibreCat-ID: 39851
Nanometer scale organic thin film transistors with Pentacene
Ch. Pannemann, T. Diekmann, U. Hilleringmann, Microelectronic Engineering 67–68 (2003) 845–852.
LibreCat
| DOI
Ch. Pannemann, T. Diekmann, U. Hilleringmann, Microelectronic Engineering 67–68 (2003) 845–852.
2002 | Journal Article | LibreCat-ID: 8733
Quantum wire fabrication from compensating-layer GaAs–AlGaAs heterostructures
D. Kähler, U. Kunze, D. Reuter, A.D. Wieck, Microelectronic Engineering (2002) 619–623.
LibreCat
| DOI
D. Kähler, U. Kunze, D. Reuter, A.D. Wieck, Microelectronic Engineering (2002) 619–623.
2002 | Journal Article | LibreCat-ID: 39912
Characterization of submicron NMOS devices due to visible light emission
I. Schönstein, J. Müller, U. Hilleringmann, K. Goser, Microelectronic Engineering 21 (2002) 363–366.
LibreCat
| DOI
I. Schönstein, J. Müller, U. Hilleringmann, K. Goser, Microelectronic Engineering 21 (2002) 363–366.
2002 | Journal Article | LibreCat-ID: 39914
Results of monolithic integration of optical waveguides, photodiodes and CMOS circuits on silicon
U. Hilleringmann, K. Goser, Microelectronic Engineering 19 (2002) 211–214.
LibreCat
| DOI
U. Hilleringmann, K. Goser, Microelectronic Engineering 19 (2002) 211–214.
2002 | Journal Article | LibreCat-ID: 39899
Characterisation of sub-100 nm-MOS-transistors processed by optical lithography and a sidewall-etchback technique
J.T. Horstmann, U. Hilleringmann, K. Goser, Microelectronic Engineering 30 (2002) 431–434.
LibreCat
| DOI
J.T. Horstmann, U. Hilleringmann, K. Goser, Microelectronic Engineering 30 (2002) 431–434.
2002 | Journal Article | LibreCat-ID: 39882
A novel insulation technique for smart power switching devices and very high voltage ICs above 10 kV
V. Mankowski, U. Hilleringmann, K. Schumacher, Microelectronic Engineering 53 (2002) 525–528.
LibreCat
| DOI
V. Mankowski, U. Hilleringmann, K. Schumacher, Microelectronic Engineering 53 (2002) 525–528.
2002 | Journal Article | LibreCat-ID: 39879
1/f-Noise of sub-100 nm-MOS-transistors fabricated by a special deposition and etchback technique
J.T. Horstmann, U. Hilleringmann, K. Goser, Microelectronic Engineering 53 (2002) 213–216.
LibreCat
| DOI
J.T. Horstmann, U. Hilleringmann, K. Goser, Microelectronic Engineering 53 (2002) 213–216.
2002 | Journal Article | LibreCat-ID: 39919
A silicon based technology for monolithic integration of waveguides and VLSI CMOS circuits
U. Hilleringmann, K. Knospe, C. Heite, K. Schumacher, K. Goser, Microelectronic Engineering 15 (2002) 289–292.
LibreCat
| DOI
U. Hilleringmann, K. Knospe, C. Heite, K. Schumacher, K. Goser, Microelectronic Engineering 15 (2002) 289–292.
2002 | Journal Article | LibreCat-ID: 39920
Floating gate structures as nonvolatile analog memory cells in 1.0μm-LOCOS-CMOS technology with PZT dielectrica
A. Soennecken, U. Hilleringmann, K. Goser, Microelectronic Engineering 15 (2002) 633–636.
LibreCat
| DOI
A. Soennecken, U. Hilleringmann, K. Goser, Microelectronic Engineering 15 (2002) 633–636.
2002 | Journal Article | LibreCat-ID: 39915
Results of monolithic integration of optical waveguides, photodiodes and CMOS circuits on silicon
U. Hilleringmann, K. Goser, Microelectronic Engineering 19 (2002) 211–214.
LibreCat
| DOI
U. Hilleringmann, K. Goser, Microelectronic Engineering 19 (2002) 211–214.
2002 | Journal Article | LibreCat-ID: 39916
CMOS compatible micromachining by dry silicon-etching techniques
S. Adams, U. Hilleringmann, K. Goser, Microelectronic Engineering 19 (2002) 191–194.
LibreCat
| DOI
S. Adams, U. Hilleringmann, K. Goser, Microelectronic Engineering 19 (2002) 191–194.
2002 | Journal Article | LibreCat-ID: 39889
12 kV low current cascaded light triggered switch on one silicon chip
V. Mankowski, U. Hilleringmann, K. Schumacher, Microelectronic Engineering 46 (2002) 413–417.
LibreCat
| DOI
V. Mankowski, U. Hilleringmann, K. Schumacher, Microelectronic Engineering 46 (2002) 413–417.
2002 | Journal Article | LibreCat-ID: 39877
A structure definition technique for 25 nm lines of silicon and related materials
U. Hilleringmann, T. Vieregge, J.T. Horstmann, Microelectronic Engineering 53 (2002) 569–572.
LibreCat
| DOI
U. Hilleringmann, T. Vieregge, J.T. Horstmann, Microelectronic Engineering 53 (2002) 569–572.